Issued Patents All Time
Showing 1–25 of 32 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11994803 | Photoresist remover compositions | Robert Arent | 2024-05-28 |
| 11518730 | Polymer compositions for self-assembly applications | Jian Yin, Guanyang Lin | 2022-12-06 |
| 11365379 | Photoresist remover compositions | Robert Arent, Guanyang Lin | 2022-06-21 |
| 11366392 | Photoresist remover compositions | Guanyang Lin | 2022-06-21 |
| 11168288 | Photoresist remover compositions | — | 2021-11-09 |
| 11067893 | Compositions and processes for self-assembly of block copolymers | Jihoon Kim, Jianhui Shan, Durairaj BASKARAN, Md S. RAHMAN | 2021-07-20 |
| 10457088 | Template for self assembly and method of making a self assembled pattern | Jihoon Kim, Jinxiu Wan, Shinji Miyazaki, Guanyang Lin | 2019-10-29 |
| 10155879 | Compositions and use thereof for modification of substrate surfaces | Guanyang Lin, Jihoon Kim, Jian Yin, Durairaj BASKARAN, Jianhui Shan | 2018-12-18 |
| 9574104 | Compositions and processes for self-assembly of block copolymers | Jihoon Kim, Jian Yin, Jianhui Shan, Guanyang Lin | 2017-02-21 |
| 9505945 | Silicon containing block copolymers for direct self-assembly application | Jian Yin, Guanyang Lin, Jihoon Kim, Margareta Paunescu | 2016-11-29 |
| 9291909 | Composition comprising a polymeric thermal acid generator and processes thereof | SungEun Hong, Yi Cao, Jian Yin, Margareta Paunescu, Muthiah Thiyagarajan | 2016-03-22 |
| 9093263 | Underlayer composition for promoting self assembly and method of making and using | Jian Yin, Guanyang Lin, Jihoon Kim, Jianhui Shan | 2015-07-28 |
| 9052598 | Compositions of neutral layer for directed self assembly block copolymers and processes thereof | Yi Cao, SungEun Hong, Jian Yin, Margareta Paunescu, Mark Neisser +1 more | 2015-06-09 |
| 9040659 | Methods and materials for removing metals in block copolymers | Jian Yin, Muthiah Thiyagarajan, SungEun Hong, Mark Neisser, Yi Cao | 2015-05-26 |
| 8852848 | Composition for coating over a photoresist pattern | Meng Li, Yi Cao, Jian Yin, DongKwan Lee, SungEun Hong +1 more | 2014-10-07 |
| 8835581 | Neutral layer polymer composition for directed self assembly and processes thereof | Orest Polishchuk, Yi Cao, SungEun Hong, Jian Yin, Guanyang Lin +2 more | 2014-09-16 |
| 8691925 | Compositions of neutral layer for directed self assembly block copolymers and processes thereof | Yi Cao, SungEun Hong, Jian Yin, Margareta Paunescu, Mark Neisser +1 more | 2014-04-08 |
| 8686109 | Methods and materials for removing metals in block copolymers | Jian Yin, Muthiah Thiyagarajan, SungEun Hong, Mark Neisser, Yi Cao | 2014-04-01 |
| 8329387 | Antireflective coating compositions | Huirong Yao, Guanyang Lin, Jian Yin, Mark Neisser, Ralph R. Dammel | 2012-12-11 |
| 8221965 | Antireflective coating compositions | Huirong Yao, Zhong Xiang, Jianhui Shan, Salem K. Mullen | 2012-07-17 |
| 8039202 | Positive-working photoimageable bottom antireflective coating | Yu Sui, Wenbing Kang, Mark Neisser, Tomohide KATAYAMA, Shuji Ding-Lee +3 more | 2011-10-18 |
| 8026040 | Silicone coating composition | WooKyu Kim, Hong Zhuang, PingHung Lu, Mark Neisser, David Abdallah +1 more | 2011-09-27 |
| 7824837 | Positive-working photoimageable bottom antireflective coating | Mark Neisser, Shuji Ding-Lee, Aritaka Hishida, Joseph E. Oberlander, Medhat Toukhy | 2010-11-02 |
| 7824844 | Solvent mixtures for antireflective coating compositions for photoresists | Zhong Xiang, Hong Zhuang, Eleazar Gonzalez, Mark Neisser | 2010-11-02 |
| 7691556 | Antireflective compositions for photoresists | Shuji Ding-Lee, Zhong Xiang, Aritaka Hishida, Jianhui Shan, Hong Zhuang | 2010-04-06 |