| 12393115 |
Positive working photosensitive material |
Weihong Liu, Chunwei Chen |
2025-08-19 |
| 11698586 |
Negative-working ultra thick film photoresist |
Aritaka Hishida, Hisashi Motobayashi, Lei Lu, Chunwei Chen, Weihong Liu |
2023-07-11 |
| 11385543 |
Enviromentally stable, thick film, chemically amplified resist |
Medhat A. Toukhy, Weihong Liu |
2022-07-12 |
| 10976662 |
Positive working photosensitive material |
Weihong Liu, Chunwei Chen, SookMee Lai, Yoshiharu Sakurai, Aritaka Hishida |
2021-04-13 |
| 9012126 |
Positive photosensitive material |
Weihong Liu, Chunwei Chen, Stephen Meyer, Medhat A. Toukhy, SookMee Lai |
2015-04-21 |
| 8906594 |
Negative-working thick film photoresist |
Chunwei Chen, Weihong Liu, Medhat A. Toukhy, Sangchul Kim, SookMee Lai |
2014-12-09 |
| 8568958 |
Underlayer composition and process thereof |
Huirong Yao, Guanyang Lin, Zachary BOGUSZ, WooKyu Kim, Mark Neisser |
2013-10-29 |
| 8524441 |
Silicon-based antireflective coating compositions |
Ruzhi Zhang, WooKyu Kim, David Abdallah, Mark Neisser, Ralph R. Dammel +1 more |
2013-09-03 |
| 8026040 |
Silicone coating composition |
Hengpeng Wu, WooKyu Kim, Hong Zhuang, Mark Neisser, David Abdallah +1 more |
2011-09-27 |
| 7666575 |
Antireflective coating compositions |
Woo-Kyu Kim, Hengpeng Wu, David Abdallah, Mark Neisser, Ruzhi Zhang +1 more |
2010-02-23 |
| 7638262 |
Antireflective composition for photoresists |
Hengpeng Wu, Zhong Xiang, Hong Zhuang, Jianhui Shan, Jian Yin +1 more |
2009-12-29 |
