Issued Patents All Time
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12393115 | Positive working photosensitive material | Weihong Liu, Chunwei Chen | 2025-08-19 |
| 11698586 | Negative-working ultra thick film photoresist | Aritaka Hishida, Hisashi Motobayashi, Lei Lu, Chunwei Chen, Weihong Liu | 2023-07-11 |
| 11385543 | Enviromentally stable, thick film, chemically amplified resist | Medhat A. Toukhy, Weihong Liu | 2022-07-12 |
| 10976662 | Positive working photosensitive material | Weihong Liu, Chunwei Chen, SookMee Lai, Yoshiharu Sakurai, Aritaka Hishida | 2021-04-13 |
| 9012126 | Positive photosensitive material | Weihong Liu, Chunwei Chen, Stephen Meyer, Medhat A. Toukhy, SookMee Lai | 2015-04-21 |
| 8906594 | Negative-working thick film photoresist | Chunwei Chen, Weihong Liu, Medhat A. Toukhy, Sangchul Kim, SookMee Lai | 2014-12-09 |
| 8568958 | Underlayer composition and process thereof | Huirong Yao, Guanyang Lin, Zachary BOGUSZ, WooKyu Kim, Mark Neisser | 2013-10-29 |
| 8524441 | Silicon-based antireflective coating compositions | Ruzhi Zhang, WooKyu Kim, David Abdallah, Mark Neisser, Ralph R. Dammel +1 more | 2013-09-03 |
| 8026040 | Silicone coating composition | Hengpeng Wu, WooKyu Kim, Hong Zhuang, Mark Neisser, David Abdallah +1 more | 2011-09-27 |
| 7666575 | Antireflective coating compositions | Woo-Kyu Kim, Hengpeng Wu, David Abdallah, Mark Neisser, Ruzhi Zhang +1 more | 2010-02-23 |
| 7638262 | Antireflective composition for photoresists | Hengpeng Wu, Zhong Xiang, Hong Zhuang, Jianhui Shan, Jian Yin +1 more | 2009-12-29 |