Issued Patents All Time
Showing 25 most recent of 42 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12276909 | Novolak/DNQ based, chemically amplified photoresist | Weihong Liu, Takanori Kudo, Hung-Yang Chen, Jian Yin | 2025-04-15 |
| 12124166 | Negative resist formulation for producing undercut pattern profiles | Anupama Mukherjee | 2024-10-22 |
| 11822242 | DNQ-type photoresist composition including alkali-soluble acrylic resins | Weihong Liu, Ping-Hung Lu, Chunwei Chen | 2023-11-21 |
| 11385543 | Enviromentally stable, thick film, chemically amplified resist | Weihong Liu, PingHung Lu | 2022-07-12 |
| 9012126 | Positive photosensitive material | Weihong Liu, PingHung Lu, Chunwei Chen, Stephen Meyer, SookMee Lai | 2015-04-21 |
| 8906594 | Negative-working thick film photoresist | Chunwei Chen, PingHung Lu, Weihong Liu, Sangchul Kim, SookMee Lai | 2014-12-09 |
| 8841062 | Positive working photosensitive material | Weihong Liu, Ping-Hung Lu, SookMee Lai, Yoshiharu Sakurai, Aritaka Hishida | 2014-09-23 |
| 8715918 | Thick film resists | Margareta Paunescu | 2014-05-06 |
| 7255970 | Photoresist composition for imaging thick films | Ping-Hung Lu, Salem K. Mullen | 2007-08-14 |
| 7070914 | Process for producing an image using a first minimum bottom antireflective coating composition | Mark Neisser, Joseph E. Oberlander, Raj Sakamuri, Shuji Ding-Lee | 2006-07-04 |
| 6844131 | Positive-working photoimageable bottom antireflective coating | Joseph E. Oberlander, Ralph R. Dammel, Shuji Ding-Lee, Mark Neisser | 2005-01-18 |
| 6140026 | Photosensitive diazonaphthoquinone esters based on selected cyclic alkyl ether-containing phenolics and their use in radiation sensitive mixtures | Andrew J. Blakeney, Arturo Norberto Medina, Lawrence Ferreira, Alfred T. Jeffries, III, Ahmad A. Naiini | 2000-10-31 |
| 6040107 | Photosensitive diazonaphthoquinone esters based on selected cyclic alkyl ether-containing phenolics and their use in radiation sensitive mixtures | Andrew J. Blakeney, Arturo Norberto Medina, Lawrence Ferreira, Alfred T. Jeffries, III, Ahmad A. Naiini | 2000-03-21 |
| 5985507 | Selected high thermal novolaks and positive-working radiation-sensitive compositions | Andrew J. Blakeney, Sanjay Malik, Joseph J. Sizensky | 1999-11-16 |
| 5602260 | Selected O-quinonediazide sulfonic acid esters of phenolic compounds and their use in radiation-sensitive compositions | Andrew J. Blakeney, Arturo Norberto Medina, Lawrence Ferreira, Sobhy Tadros | 1997-02-11 |
| 5547814 | O-quinonediazide sulfonic acid esters of phenolic compounds and their use in forming positive images | Andrew J. Blakeney, Arturo Norberto Medina, Lawrence Ferreira, Sobhy Tadros | 1996-08-20 |
| 5541033 | Selected o-quinonediazide sulfonic acid esters of phenolic compounds and their use in radiation-sensitive compositions | Andrew J. Blakeney, Arturo Norberto Medina, Lawrence Ferreira, Sobhy Tadros | 1996-07-30 |
| 5494785 | High ortho-ortho bonded novolak binder resins and their use in a process for forming positive resist patterns | Joseph J. Sizensky, Thomas R. Sarubbi | 1996-02-27 |
| 5473045 | High ortho-ortho bonded novolak binder resins and their use in radiation-sensitive compositions | Joseph J. Sizensky, Thomas R. Sarubbi | 1995-12-05 |
| 5413894 | High ortho-ortho bonded novolak binder resins and their use in radiation-sensitive compositions | Joseph J. Sizensky, Thomas R. Sarubbi | 1995-05-09 |
| 5338653 | Phenolic novolak resin compositions containing 5-indanol and their use a process for forming positive resist patterns | — | 1994-08-16 |
| 5328806 | Positive image formation utilizing radiation sensitive mixture containing dimeric or trimeric sesamol/aldehyde condensation products as sensitivity enhancers | — | 1994-07-12 |
| 5316884 | Radiation-sensitive compositions containing 5-indanol in the binder resin as a comonomer | — | 1994-05-31 |
| 5312720 | Process of developing a positive image utilizing o-naphthoquinone diazide radiation-sensitive esters of phenolic derivatives of 4-(4-hydroxyphenyl)cyclohexanone | Alfred T. Jeffries, III | 1994-05-17 |
| 5278021 | O-naphthoquinone diazide sulfonyl esters of 4-(4-hydroxyphenyl)cyclohexanone phenolic derivatives with associated radiation sensitive mixtures and articles | Alfred T. Jeffries, III | 1994-01-11 |