Issued Patents All Time
Showing 26–42 of 42 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5275911 | Sesamol/aldehyde condensation products as sensitivity enhancers for radiation sensitive mixtures | — | 1994-01-04 |
| 5254440 | Selected methylol-substituted trihydroxybenzophenones and their use in phenolic resin compositions and processes of forming resist images | — | 1993-10-19 |
| 5250653 | Phenolic novolak resin compositions containing 5-indanol and their use in radiation-sensitive compositions | — | 1993-10-05 |
| 5239122 | Selected methylol-substituted trihydroxybenzophenones and their use in phenolic resin compositions | — | 1993-08-24 |
| 5219714 | Selected trihydroxybenzophenone compounds and their use in photoactive compounds and radiation sensitive mixtures | Alfred T. Jeffries, III | 1993-06-15 |
| 5220073 | Selected trihydroxybenzophenone compounds | Alfred T. Jeffries, III | 1993-06-15 |
| 5196517 | Selected trihydroxybenzophenone compounds and their use as photoactive compounds | Alfred T. Jeffries, III | 1993-03-23 |
| 5177172 | Selected methylol-substituted trihydroxybenzophenones and their use in phenolic resin compositions | — | 1993-01-05 |
| 5164286 | Photoresist developer containing fluorinated amphoteric surfactant | Andrew J. Blakeney, Robert F. Rogler, David Brzozowy | 1992-11-17 |
| 5019478 | Selected trihydroxybenzophenone compounds and their use in photoactive compounds and radiation sensitive mixtures | Alfred T. Jeffries, III. | 1991-05-28 |
| 5002851 | Light sensitive composition with o-quinone diazide and phenolic novolak resin made using methylol substituted trihydroxybenzophenone as reactant | — | 1991-03-26 |
| 4992356 | Process of developing a radiation imaged product with trinuclear novolak oligomer having o-naphthoquinone diazide sulfonyl group | Alfred T. Jeffries, III, Andrew J. Blakeney | 1991-02-12 |
| 4992596 | Selected trinuclear novolak oligomers and their use in photoactive compounds and radiation sensitive mixtures | Alfred T. Jeffries, III, Andrew J. Blakeney | 1991-02-12 |
| 4957846 | Radiation sensitive compound and mixtures with trinuclear novolak oligomer with o-naphthoquinone diazide sulfonyl group | Alfred T. Jeffries, III, Andrew J. Blakeney | 1990-09-18 |
| 4587196 | Positive photoresist with cresol-formaldehyde novolak resin and photosensitive naphthoquinone diazide | — | 1986-05-06 |
| 4529682 | Positive photoresist composition with cresol-formaldehyde novolak resins | — | 1985-07-16 |
| 4377631 | Positive novolak photoresist compositions | Leo Klawansky | 1983-03-22 |