| 6911297 |
Photoresist compositions |
J. Thomas Kocab, John P. Hatfield, Lawerence Ferreira, Andrew J. Blakeney |
2005-06-28 |
| 5346799 |
Novolak resins and their use in radiation-sensitive compositions wherein the novolak resins are made by condensing 2,6-dimethylphenol, 2,3-dimethylphenol, a para-substituted phenol and an aldehyde |
Alfred T. Jeffries, III |
1994-09-13 |
| 5284737 |
Process of developing an image utilizing positive-working radiation sensitive mixtures containing alkali-soluble binder, o-quinonediazide photoactive compound and blankophor FBW actinic dye |
Tripunithura V. Jayaraman |
1994-02-08 |
| 5275909 |
Positive-working radiation sensitive mixtures and articles containing alkali-soluble binder, o-quinonediazide photoactive compound and BLANKOPHOR FBW acting dye |
Tripunithura V. Jayaraman |
1994-01-04 |
| 5164286 |
Photoresist developer containing fluorinated amphoteric surfactant |
Andrew J. Blakeney, Robert F. Rogler, Medhat A. Toukhy |
1992-11-17 |