Issued Patents All Time
Showing 1–25 of 45 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7217497 | Hydroxy-amino thermally cured undercoat for 193 nm lithography | Patrick Foster, Sydney George Slater, Thomas Steinhausler, John Biafore | 2007-05-15 |
| 6924339 | Thermally cured underlayer for lithographic application | Binod B. De, Sanjay Malik, Gregory Spaziano, John Biafore, Patrick Foster +2 more | 2005-08-02 |
| 6911297 | Photoresist compositions | David Brzozowy, J. Thomas Kocab, John P. Hatfield, Lawerence Ferreira | 2005-06-28 |
| 6855476 | Photoacid generators for use in photoresist compositions | Lawrence Ferreira, Gregory Spaziano, Ognian N. Dimov, J. Thomas Kocab, John P. Hatfield | 2005-02-15 |
| 6783917 | Silicon-containing acetal protected polymers and photoresists compositions thereof | Sanjay Malik, Stephanie Dilocker, John Ferri, Jeffery Eisele | 2004-08-31 |
| 6783916 | Hydroxy-amino thermally cured undercoat of 193 nm lithography | Patrick Foster, Sydney George Slater, Thomas Steinhausler, John Biafore | 2004-08-31 |
| 6610808 | Thermally cured underlayer for lithographic application | Binod B. De, Sanjay Malik, Gregory Spaziano, John Biafore, Patrick Foster +2 more | 2003-08-26 |
| 6514664 | Radiation sensitive compositions containing image quality and profile enhancement additives | Medhat A. Touky, Gail McCormick, Jacqueline Marshall | 2003-02-04 |
| 6492092 | Hydroxy-epoxide thermally cured undercoat for 193 NM lithography | Patrick Foster, Sydney George Slater, Thomas Steinhausler, John Biafore | 2002-12-10 |
| 6380317 | Production of acetal derivatized hydroxyl aromatic polymers and their use in radiation sensitive formulations | Sanjay Malik, Lawrence Ferreira, Joseph J. Sizensky, Brian Edison Maxwell | 2002-04-30 |
| 6323287 | Hydroxy-amino thermally cured undercoat for 193 NM lithography | Patrick Foster, Sydney George Slater, Thomas Steinhausler, John Biafore | 2001-11-27 |
| 6309793 | Production of acetal derivatized hydroxyl aromatic polymers and their use in radiation sensitive formulations | Sanjay Malik, Lawrence Ferreira, Joseph J. Sizensky, Brian Edison Maxwell | 2001-10-30 |
| 6159653 | Production of acetal derivatized hydroxyl aromatic polymers and their use in radiation sensitive formulations | Sanjay Malik, Lawrence Ferreira, Joseph J. Sizensky, Brian Edison Maxwell | 2000-12-12 |
| 6146793 | Radiation sensitive terpolymer, photoresist compositions thereof and 193 nm bilayer systems | Ulrich Schaedeli, Thomas Steinhausler, Daniela White, Allen H. Gabor | 2000-11-14 |
| 6143467 | Photosensitive polybenzoxazole precursor compositions | Steve Lien-Chung Hsu, Pamela J. Waterson, Ahmad A. Naiini, William D. Weber, Sanjay Malik | 2000-11-07 |
| 6140026 | Photosensitive diazonaphthoquinone esters based on selected cyclic alkyl ether-containing phenolics and their use in radiation sensitive mixtures | Arturo Norberto Medina, Medhat A. Toukhy, Lawrence Ferreira, Alfred T. Jeffries, III, Ahmad A. Naiini | 2000-10-31 |
| 6133412 | Production of acetal derivatized hydroxyl aromatic polymers and their use in radiation sensitive formulations | Sanjay Malik, Lawrence Ferreira, Joseph J. Sizensky, Brian Edison Maxwell | 2000-10-17 |
| 6054248 | Hydroxy-diisocyanate thermally cured undercoat for 193 nm lithography | Patrick Foster, Sydney George Slater, Thomas Steinhausler, John Biafore | 2000-04-25 |
| 6040107 | Photosensitive diazonaphthoquinone esters based on selected cyclic alkyl ether-containing phenolics and their use in radiation sensitive mixtures | Arturo Norberto Medina, Medhat A. Toukhy, Lawrence Ferreira, Alfred T. Jeffries, III, Ahmad A. Naiini | 2000-03-21 |
| 6027853 | Process for preparing a radiation-sensitive composition | Sanjay Malik, Joseph J. Sizensky | 2000-02-22 |
| 5985507 | Selected high thermal novolaks and positive-working radiation-sensitive compositions | Sanjay Malik, Medhat A. Toukhy, Joseph J. Sizensky | 1999-11-16 |
| 5834581 | Process for making polyimide-polyamic ester copolymers | Ahmad A. Naiini, Steve Lien-Chung Hsu, William D. Weber | 1998-11-10 |
| 5789525 | Process for making polyimides from diamines and tetracarboxylic diacid diester | Ahmad A. Naiini, Steve Lien-Chung Hsu, William D. Weber | 1998-08-04 |
| 5789524 | Chemical imidization reagent for polyimide synthesis | Steve Lien-Chung Hsu, Ahmad A. Naiini, William D. Weber | 1998-08-04 |
| 5602260 | Selected O-quinonediazide sulfonic acid esters of phenolic compounds and their use in radiation-sensitive compositions | Arturo Norberto Medina, Medhat A. Toukhy, Lawrence Ferreira, Sobhy Tadros | 1997-02-11 |