Issued Patents All Time
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8188166 | Unsaturated polyester resin compositions with improved weatherability | John McAlvin, Daniel A. Oakley, James S. Tedesco, Thomas Folda, Paul Taylor Hutson +5 more | 2012-05-29 |
| 7217497 | Hydroxy-amino thermally cured undercoat for 193 nm lithography | Patrick Foster, Sydney George Slater, Andrew J. Blakeney, John Biafore | 2007-05-15 |
| 6924339 | Thermally cured underlayer for lithographic application | Binod B. De, Sanjay Malik, Gregory Spaziano, John Biafore, Patrick Foster +2 more | 2005-08-02 |
| 6783916 | Hydroxy-amino thermally cured undercoat of 193 nm lithography | Patrick Foster, Sydney George Slater, Andrew J. Blakeney, John Biafore | 2004-08-31 |
| 6767950 | Pigmented, weatherable molding compositions | Robert Walrath, John Young, Thomas Folda, Mark S. Harber | 2004-07-27 |
| 6759466 | Molding compositions having improved properties | John Young, Thomas Folda, Thomas C. Kendrick, Jr. | 2004-07-06 |
| 6610808 | Thermally cured underlayer for lithographic application | Binod B. De, Sanjay Malik, Gregory Spaziano, John Biafore, Patrick Foster +2 more | 2003-08-26 |
| 6492092 | Hydroxy-epoxide thermally cured undercoat for 193 NM lithography | Patrick Foster, Sydney George Slater, Andrew J. Blakeney, John Biafore | 2002-12-10 |
| 6323287 | Hydroxy-amino thermally cured undercoat for 193 NM lithography | Patrick Foster, Sydney George Slater, Andrew J. Blakeney, John Biafore | 2001-11-27 |
| 6146793 | Radiation sensitive terpolymer, photoresist compositions thereof and 193 nm bilayer systems | Ulrich Schaedeli, Andrew J. Blakeney, Daniela White, Allen H. Gabor | 2000-11-14 |
| 6054248 | Hydroxy-diisocyanate thermally cured undercoat for 193 nm lithography | Patrick Foster, Sydney George Slater, Andrew J. Blakeney, John Biafore | 2000-04-25 |