Issued Patents All Time
Showing 25 most recent of 45 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12203022 | Formulations for high selective silicon nitride etch | David Kuiper, Susan DiMeo | 2025-01-21 |
| 11905491 | Post CMP cleaning compositions | Youngmin Kim, Michael White | 2024-02-20 |
| 11845917 | Compositions and methods for post-CMP cleaning of cobalt substrates | Donald Frye, Elizabeth THOMAS, Jun Liu, Michael White | 2023-12-19 |
| 11781066 | Wet etching composition and method | Youngmin Kim, Michael White, Emanuel I. Cooper, Steven M. Bilodeau | 2023-10-10 |
| 11530356 | Compositions and methods for selectively etching silicon nitride films | Steven M. Bilodeau, Emanuel I. Cooper | 2022-12-20 |
| 11492709 | Method and composition for etching molybdenum | Atanu K. Das, Emanuel I. Cooper, Eric Hong, JeongYeol Yang, Juhee Yeo +5 more | 2022-11-08 |
| 11446708 | Compositions and methods for reducing interaction between abrasive particles and a cleaning brush | — | 2022-09-20 |
| 11421157 | Formulations for high selective silicon nitride etch | David Kuiper, Susan DiMeo | 2022-08-23 |
| 11365351 | Wet etching composition and method | Youngmin Kim, Michael White, Emanuel I. Cooper, Steven M. Bilodeau | 2022-06-21 |
| 11164738 | Compositions and methods for removing ceria particles from a surface | Thomas Parson, Michael White, Emanuel I. Cooper, Atanu K. Das | 2021-11-02 |
| 11149235 | Cleaning composition with corrosion inhibitor | Elizabeth THOMAS, Jun Liu, Michael White, Chao-Yu Wang, Donald Frye | 2021-10-19 |
| 11124740 | Post chemical mechanical polishing cleaning compositions | Atanu K. Das, Michael White | 2021-09-21 |
| 11124741 | Ceria removal compositions | Atanu K. Das, Michael White | 2021-09-21 |
| 11124746 | Post CMP cleaning composition | Michael White, Jun Liu, Elizabeth THOMAS | 2021-09-21 |
| 11085011 | Post CMP cleaning compositions for ceria particles | Elizabeth THOMAS, Michael White, Atanu K. Das | 2021-08-10 |
| 10988718 | Tungsten post-CMP cleaning composition | Thomas Parson, Shrane-Ning Jenq, Steven Medd, Michael White, Donald Frye | 2021-04-27 |
| 10731109 | Post chemical mechanical polishing formulations and method of use | Donald Frye, Jun Liu, Michael White | 2020-08-04 |
| 10138117 | Aqueous formulations for removing metal hard mask and post-etch residue with Cu/W compatibility | Li-Min Chen, Steven Lippy, Emanuel I. Cooper | 2018-11-27 |
| 8541310 | CMP compositions containing a soluble peroxometalate complex and methods of use thereof | John Parker | 2013-09-24 |
| 8057561 | Polyoxometalate compositions and methods | John Parker | 2011-11-15 |
| 8008202 | Ruthenium CMP compositions and methods | John Parker | 2011-08-30 |
| 7994057 | Polishing composition and method utilizing abrasive particles treated with an aminosilane | Jeffrey Dysard, Sriram Anjur, Steven Grumbine, William Ward | 2011-08-09 |
| 7955520 | Copper-passivating CMP compositions and methods | Jason Keleher, John Parker | 2011-06-07 |
| 7803711 | Low pH barrier slurry based on titanium dioxide | John Parker | 2010-09-28 |
| 7351781 | Synthesis of vinyl polymers by controlled radical polymerization | James B. O'Dwyer | 2008-04-01 |