| 8759216 |
Compositions and methods for polishing silicon nitride materials |
Jeffrey Dysard, Timothy Johns, Zhan Chen |
2014-06-24 |
| 8741009 |
Polishing composition containing polyether amine |
Jeffrey Dysard, Paul M. Feeney, Timothy Johns, Yun-Biao Xin, Li Xia Wang |
2014-06-03 |
| 7994057 |
Polishing composition and method utilizing abrasive particles treated with an aminosilane |
Jeffrey Dysard, Steven Grumbine, Daniela White, William Ward |
2011-08-09 |
| 7897061 |
Compositions and methods for CMP of phase change alloys |
Jeffrey Dysard, Paul M. Feeney |
2011-03-01 |
| 7837888 |
Composition and method for damascene CMP |
Paul M. Feeney, Jeffrey Dysard |
2010-11-23 |
| 7585340 |
Polishing composition containing polyether amine |
Jeffrey Dysard, Paul M. Feeney, Timothy Johns, Yun-Biao Xin, Li Xia Wang |
2009-09-08 |
| 7438795 |
Electrochemical-mechanical polishing system |
Ian Wylie |
2008-10-21 |
| 6685540 |
Polishing pad comprising particles with a solid core and polymeric shell |
Isaac K. Cherian, Steven Grumbine |
2004-02-03 |
| 6126532 |
Polishing pads for a semiconductor substrate |
Roland Sevilla, Frank B. Kaufman |
2000-10-03 |
| 6117000 |
Polishing pad for a semiconductor substrate |
William C. Downing |
2000-09-12 |
| 6062968 |
Polishing pad for a semiconductor substrate |
Roland Sevilla, Frank B. Kaufman |
2000-05-16 |
| 6046377 |
Absorbent structure comprising superabsorbent, staple fiber, and binder fiber |
Andrew Edsel Huntoon, Randy E. Meirowitz, Robert J. Phelan, Kim Te Tang, Anthony John Wisneski |
2000-04-04 |
| 5849000 |
Absorbent structure having improved liquid permeability |
Michael Kalmon, Anthony John Wisneski |
1998-12-15 |
| 5645542 |
Elastomeric absorbent structure |
Ketan N. Shah, Anthony John Wisneski |
1997-07-08 |