| 8435421 |
Metal-passivating CMP compositions and methods |
Pankaj Kumar Singh, Vlasta Brusic |
2013-05-07 |
| 7955520 |
Copper-passivating CMP compositions and methods |
Daniela White, John Parker |
2011-06-07 |
| 7456107 |
Compositions and methods for CMP of low-k-dielectric materials |
Daniel Woodland, Francesco De Rege Thesauro, Robert E. Medsker, Jason Aggio |
2008-11-25 |
| 6916428 |
Photo-chemical remediation of Cu-CMP waste |
Yuzhuo Li, Ning GAO |
2005-07-12 |
| 6660639 |
Method of fabricating a copper damascene structure |
Yuzhuo Li |
2003-12-09 |
| 6656241 |
Silica-based slurry |
Stuart D. Hellring, Colin P. McCann, Charles F. Kahle, II, Yuzhuo Li |
2003-12-02 |
| 6508953 |
Slurry for chemical-mechanical polishing copper damascene structures |
Yuzhuo Li |
2003-01-21 |
| 6258721 |
Diamond slurry for chemical-mechanical planarization of semiconductor wafers |
Yuzhuo Li, David Cerutti, Donald Joseph Buckley, Earl Royce Tyre, Jr., Richard J. Uriarte +1 more |
2001-07-10 |
| 6242351 |
Diamond slurry for chemical-mechanical planarization of semiconductor wafers |
Yuzhuo Li, David Cerutti, Donald Joseph Buckley, Earl Royce Tyre, Jr., Richard J. Uriarte +1 more |
2001-06-05 |
