Issued Patents All Time
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7217497 | Hydroxy-amino thermally cured undercoat for 193 nm lithography | Patrick Foster, Thomas Steinhausler, Andrew J. Blakeney, John Biafore | 2007-05-15 |
| 6783916 | Hydroxy-amino thermally cured undercoat of 193 nm lithography | Patrick Foster, Thomas Steinhausler, Andrew J. Blakeney, John Biafore | 2004-08-31 |
| 6492092 | Hydroxy-epoxide thermally cured undercoat for 193 NM lithography | Patrick Foster, Thomas Steinhausler, Andrew J. Blakeney, John Biafore | 2002-12-10 |
| 6323287 | Hydroxy-amino thermally cured undercoat for 193 NM lithography | Patrick Foster, Thomas Steinhausler, Andrew J. Blakeney, John Biafore | 2001-11-27 |
| 6054248 | Hydroxy-diisocyanate thermally cured undercoat for 193 nm lithography | Patrick Foster, Thomas Steinhausler, Andrew J. Blakeney, John Biafore | 2000-04-25 |
| 5258260 | Aqueous developable deep UV negative resist | Stanley A. Ficner | 1993-11-02 |
| 5258265 | Aqueous developable deep UV negative resist | Stanley A. Ficner | 1993-11-02 |
| 5178987 | Aqueous developable deep UV negative resist containing benzannelated acetic acid and novolak resin | Stanley A. Ficner | 1993-01-12 |
| 4902603 | Photoresist compositions containing selected 6-acetoxy cyclohexadienone photosensitizers and novolak resins | Stanley A. Ficner | 1990-02-20 |