Issued Patents All Time
Showing 1–16 of 16 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6380317 | Production of acetal derivatized hydroxyl aromatic polymers and their use in radiation sensitive formulations | Sanjay Malik, Andrew J. Blakeney, Lawrence Ferreira, Brian Edison Maxwell | 2002-04-30 |
| 6309793 | Production of acetal derivatized hydroxyl aromatic polymers and their use in radiation sensitive formulations | Sanjay Malik, Andrew J. Blakeney, Lawrence Ferreira, Brian Edison Maxwell | 2001-10-30 |
| 6159653 | Production of acetal derivatized hydroxyl aromatic polymers and their use in radiation sensitive formulations | Sanjay Malik, Andrew J. Blakeney, Lawrence Ferreira, Brian Edison Maxwell | 2000-12-12 |
| 6133412 | Production of acetal derivatized hydroxyl aromatic polymers and their use in radiation sensitive formulations | Sanjay Malik, Andrew J. Blakeney, Lawrence Ferreira, Brian Edison Maxwell | 2000-10-17 |
| 6027853 | Process for preparing a radiation-sensitive composition | Sanjay Malik, Andrew J. Blakeney | 2000-02-22 |
| 5985507 | Selected high thermal novolaks and positive-working radiation-sensitive compositions | Andrew J. Blakeney, Sanjay Malik, Medhat A. Toukhy | 1999-11-16 |
| 5494785 | High ortho-ortho bonded novolak binder resins and their use in a process for forming positive resist patterns | Thomas R. Sarubbi, Medhat A. Toukhy | 1996-02-27 |
| 5473045 | High ortho-ortho bonded novolak binder resins and their use in radiation-sensitive compositions | Thomas R. Sarubbi, Medhat A. Toukhy | 1995-12-05 |
| 5413894 | High ortho-ortho bonded novolak binder resins and their use in radiation-sensitive compositions | Thomas R. Sarubbi, Medhat A. Toukhy | 1995-05-09 |
| 5350827 | Selected structurally defined novolak binder resins and their use in radiation-sensitive compositions | Thomas R. Sarubbi | 1994-09-27 |
| 5338652 | Selected structurally defined novolak binder resins and their use in photoresist pattern formation | Thomas R. Sarubbi | 1994-08-16 |
| 5306594 | Radiation-sensitive compositions using novolak resins made from a substituted bis(hydroxyphenyl)methane and a bis-(methylol)-cresol | Thomas R. Sarubbi | 1994-04-26 |
| 5053479 | Thermally stable phenolic resin compositions and their use in light-sensitive compositions | Andrew J. Blakeney, Thomas R. Sarubbi | 1991-10-01 |
| 5001040 | Process of forming resist image in positive photoresist with thermally stable phenolic resin | Andrew J. Blakeney, Thomas R. Sarubbi | 1991-03-19 |
| 4959292 | Light-sensitive o-quinone diazide composition and product with phenolic novolak prepared by condensation with haloacetoaldehyde | Andrew J. Blakeney, Thomas R. Sarubbi | 1990-09-25 |
| 4617251 | Stripping composition and method of using the same | — | 1986-10-14 |