| 7416821 |
Thermally cured undercoat for lithographic application |
Binod B. De, Sanjay Malik, J. Thomas Kocab |
2008-08-26 |
| 5494785 |
High ortho-ortho bonded novolak binder resins and their use in a process for forming positive resist patterns |
Joseph J. Sizensky, Medhat A. Toukhy |
1996-02-27 |
| 5473045 |
High ortho-ortho bonded novolak binder resins and their use in radiation-sensitive compositions |
Joseph J. Sizensky, Medhat A. Toukhy |
1995-12-05 |
| 5413894 |
High ortho-ortho bonded novolak binder resins and their use in radiation-sensitive compositions |
Joseph J. Sizensky, Medhat A. Toukhy |
1995-05-09 |
| 5350827 |
Selected structurally defined novolak binder resins and their use in radiation-sensitive compositions |
Joseph J. Sizensky |
1994-09-27 |
| 5338652 |
Selected structurally defined novolak binder resins and their use in photoresist pattern formation |
Joseph J. Sizensky |
1994-08-16 |
| 5306594 |
Radiation-sensitive compositions using novolak resins made from a substituted bis(hydroxyphenyl)methane and a bis-(methylol)-cresol |
Joseph J. Sizensky |
1994-04-26 |
| 5151339 |
Photoresist composition containing diazoquinone photosensitizer and novalak resin characterized by the complete and selective removal of dimeric species from the novolak resin |
— |
1992-09-29 |
| 5132376 |
Process for selective removal of dimeric species from phenolic polymers |
— |
1992-07-21 |
| 5053479 |
Thermally stable phenolic resin compositions and their use in light-sensitive compositions |
Andrew J. Blakeney, Joseph J. Sizensky |
1991-10-01 |
| 5024921 |
Thermally stable light-sensitive compositions with o-quinone diazide and phenolic resin used in a method of forming a positive photoresist image |
Andrew J. Blakeney, Alfred T. Jeffries, III |
1991-06-18 |
| 5001040 |
Process of forming resist image in positive photoresist with thermally stable phenolic resin |
Andrew J. Blakeney, Joseph J. Sizensky |
1991-03-19 |
| 4970287 |
Thermally stable phenolic resin compositions with ortho, ortho methylene linkage |
Andrew J. Blakeney, Alfred T. Jeffries, III |
1990-11-13 |
| 4959292 |
Light-sensitive o-quinone diazide composition and product with phenolic novolak prepared by condensation with haloacetoaldehyde |
Andrew J. Blakeney, Joseph J. Sizensky |
1990-09-25 |
| 4837121 |
Thermally stable light-sensitive compositions with o-quinone diazide and phenolic resin |
Andrew J. Blakeney, Alfred T. Jeffries, III |
1989-06-06 |