Issued Patents All Time
Showing 1–15 of 15 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7416821 | Thermally cured undercoat for lithographic application | Binod B. De, Sanjay Malik, J. Thomas Kocab | 2008-08-26 |
| 5494785 | High ortho-ortho bonded novolak binder resins and their use in a process for forming positive resist patterns | Joseph J. Sizensky, Medhat A. Toukhy | 1996-02-27 |
| 5473045 | High ortho-ortho bonded novolak binder resins and their use in radiation-sensitive compositions | Joseph J. Sizensky, Medhat A. Toukhy | 1995-12-05 |
| 5413894 | High ortho-ortho bonded novolak binder resins and their use in radiation-sensitive compositions | Joseph J. Sizensky, Medhat A. Toukhy | 1995-05-09 |
| 5350827 | Selected structurally defined novolak binder resins and their use in radiation-sensitive compositions | Joseph J. Sizensky | 1994-09-27 |
| 5338652 | Selected structurally defined novolak binder resins and their use in photoresist pattern formation | Joseph J. Sizensky | 1994-08-16 |
| 5306594 | Radiation-sensitive compositions using novolak resins made from a substituted bis(hydroxyphenyl)methane and a bis-(methylol)-cresol | Joseph J. Sizensky | 1994-04-26 |
| 5151339 | Photoresist composition containing diazoquinone photosensitizer and novalak resin characterized by the complete and selective removal of dimeric species from the novolak resin | — | 1992-09-29 |
| 5132376 | Process for selective removal of dimeric species from phenolic polymers | — | 1992-07-21 |
| 5053479 | Thermally stable phenolic resin compositions and their use in light-sensitive compositions | Andrew J. Blakeney, Joseph J. Sizensky | 1991-10-01 |
| 5024921 | Thermally stable light-sensitive compositions with o-quinone diazide and phenolic resin used in a method of forming a positive photoresist image | Andrew J. Blakeney, Alfred T. Jeffries, III | 1991-06-18 |
| 5001040 | Process of forming resist image in positive photoresist with thermally stable phenolic resin | Andrew J. Blakeney, Joseph J. Sizensky | 1991-03-19 |
| 4970287 | Thermally stable phenolic resin compositions with ortho, ortho methylene linkage | Andrew J. Blakeney, Alfred T. Jeffries, III | 1990-11-13 |
| 4959292 | Light-sensitive o-quinone diazide composition and product with phenolic novolak prepared by condensation with haloacetoaldehyde | Andrew J. Blakeney, Joseph J. Sizensky | 1990-09-25 |
| 4837121 | Thermally stable light-sensitive compositions with o-quinone diazide and phenolic resin | Andrew J. Blakeney, Alfred T. Jeffries, III | 1989-06-06 |