Issued Patents All Time
Showing 1–25 of 25 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6140026 | Photosensitive diazonaphthoquinone esters based on selected cyclic alkyl ether-containing phenolics and their use in radiation sensitive mixtures | Andrew J. Blakeney, Arturo Norberto Medina, Medhat A. Toukhy, Lawrence Ferreira, Ahmad A. Naiini | 2000-10-31 |
| 6040107 | Photosensitive diazonaphthoquinone esters based on selected cyclic alkyl ether-containing phenolics and their use in radiation sensitive mixtures | Andrew J. Blakeney, Arturo Norberto Medina, Medhat A. Toukhy, Lawrence Ferreira, Ahmad A. Naiini | 2000-03-21 |
| 5366843 | Coated substrate utilizing composition including selected phenolic derivatives of 4-(4-hydroxyphenyl)-cyclohexanone as sensitivity enhancers | — | 1994-11-22 |
| 5346799 | Novolak resins and their use in radiation-sensitive compositions wherein the novolak resins are made by condensing 2,6-dimethylphenol, 2,3-dimethylphenol, a para-substituted phenol and an aldehyde | David Brzozowy | 1994-09-13 |
| 5346808 | Positive image formation utilizing o-quinonediazide composition including selected phenolic derivatives of 4-(4-hydroxyphenyl)-cyclohexanone | — | 1994-09-13 |
| 5312720 | Process of developing a positive image utilizing o-naphthoquinone diazide radiation-sensitive esters of phenolic derivatives of 4-(4-hydroxyphenyl)cyclohexanone | Medhat A. Toukhy | 1994-05-17 |
| 5302688 | Selected block phenolic oligomers and their use in phenolic resin compositions and in radiation-sensitive resist compositions | Kenji Honda, Andrew J. Blakeney, Sobhy Tadros | 1994-04-12 |
| 5283374 | Selected phenolic derivatives of 4-(4-hydroxyphenyl)-cyclohexanone and their use as sensitivity enhancers for radiation sensitive mixtures | — | 1994-02-01 |
| 5278021 | O-naphthoquinone diazide sulfonyl esters of 4-(4-hydroxyphenyl)cyclohexanone phenolic derivatives with associated radiation sensitive mixtures and articles | Medhat A. Toukhy | 1994-01-11 |
| 5235022 | Selected block copolymer novolak binder resins | Kenji Honda, Andrew J. Blakeney, Sobhy Tadros | 1993-08-10 |
| 5234795 | Process of developing an image-wise exposed resist-coated substrate | Kenji Honda, Andrew J. Blakeney, Sobhy Tadros | 1993-08-10 |
| 5232819 | Selected block phenolic oligomers and their use in phenolic resin compositions and in radiation-sensitive resist compositions | Kenji Honda, Andrew J. Blakeney, Sobhy Tadros | 1993-08-03 |
| 5219714 | Selected trihydroxybenzophenone compounds and their use in photoactive compounds and radiation sensitive mixtures | Medhat A. Toukhy | 1993-06-15 |
| 5220073 | Selected trihydroxybenzophenone compounds | Medhat A. Toukhy | 1993-06-15 |
| 5196517 | Selected trihydroxybenzophenone compounds and their use as photoactive compounds | Medhat A. Toukhy | 1993-03-23 |
| 5196289 | Selected block phenolic oligomers and their use in radiation-sensitive resist compositions | Kenji Honda, Andrew J. Blakeney, Sobhy Tadros | 1993-03-23 |
| 5188921 | Selected block copolymer novolak binder resins in radiation-sensitive resist compositions | Kenji Honda, Andrew J. Blakeney, Sobhy Tadros | 1993-02-23 |
| 5024921 | Thermally stable light-sensitive compositions with o-quinone diazide and phenolic resin used in a method of forming a positive photoresist image | Andrew J. Blakeney, Thomas R. Sarubbi | 1991-06-18 |
| 4992596 | Selected trinuclear novolak oligomers and their use in photoactive compounds and radiation sensitive mixtures | Andrew J. Blakeney, Medhat A. Toukhy | 1991-02-12 |
| 4992356 | Process of developing a radiation imaged product with trinuclear novolak oligomer having o-naphthoquinone diazide sulfonyl group | Andrew J. Blakeney, Medhat A. Toukhy | 1991-02-12 |
| 4970287 | Thermally stable phenolic resin compositions with ortho, ortho methylene linkage | Andrew J. Blakeney, Thomas R. Sarubbi | 1990-11-13 |
| 4957846 | Radiation sensitive compound and mixtures with trinuclear novolak oligomer with o-naphthoquinone diazide sulfonyl group | Andrew J. Blakeney, Medhat A. Toukhy | 1990-09-18 |
| 4837121 | Thermally stable light-sensitive compositions with o-quinone diazide and phenolic resin | Andrew J. Blakeney, Thomas R. Sarubbi | 1989-06-06 |
| 4797345 | Light-sensitive 1,2-naphthoquinone-2-diazide-4-sulfonic acid monoesters of cycloalkyl substituted phenol and their use in light-sensitive mixtures | — | 1989-01-10 |
| 4617252 | Antireflective coatings for use in the manufacture of semi-conductor devices, methods and solutions for making such coatings, and the method for using such coatings to absorb light in ultraviolet photolithography processes | William F. Cordes, III | 1986-10-14 |