ST

Sobhy Tadros

OM Ocg Microelectronic Materials: 11 patents #5 of 42Top 15%
Overall (All Time): #473,815 of 4,157,543Top 15%
11
Patents All Time

Issued Patents All Time

Showing 1–11 of 11 patents

Patent #TitleCo-InventorsDate
5602260 Selected O-quinonediazide sulfonic acid esters of phenolic compounds and their use in radiation-sensitive compositions Andrew J. Blakeney, Arturo Norberto Medina, Medhat A. Toukhy, Lawrence Ferreira 1997-02-11
5547814 O-quinonediazide sulfonic acid esters of phenolic compounds and their use in forming positive images Andrew J. Blakeney, Arturo Norberto Medina, Medhat A. Toukhy, Lawrence Ferreira 1996-08-20
5541033 Selected o-quinonediazide sulfonic acid esters of phenolic compounds and their use in radiation-sensitive compositions Andrew J. Blakeney, Arturo Norberto Medina, Medhat A. Toukhy, Lawrence Ferreira 1996-07-30
5302688 Selected block phenolic oligomers and their use in phenolic resin compositions and in radiation-sensitive resist compositions Alfred T. Jeffries, III, Kenji Honda, Andrew J. Blakeney 1994-04-12
5234795 Process of developing an image-wise exposed resist-coated substrate Alfred T. Jeffries, III, Kenji Honda, Andrew J. Blakeney 1993-08-10
5235022 Selected block copolymer novolak binder resins Alfred T. Jeffries, III, Kenji Honda, Andrew J. Blakeney 1993-08-10
5232819 Selected block phenolic oligomers and their use in phenolic resin compositions and in radiation-sensitive resist compositions Alfred T. Jeffries, III, Kenji Honda, Andrew J. Blakeney 1993-08-03
5225318 Selected photoactive methylolated cyclohexanol compounds and their use in forming positive resist image patterns 1993-07-06
5196289 Selected block phenolic oligomers and their use in radiation-sensitive resist compositions Alfred T. Jeffries, III, Kenji Honda, Andrew J. Blakeney 1993-03-23
5188921 Selected block copolymer novolak binder resins in radiation-sensitive resist compositions Alfred T. Jeffries, III, Kenji Honda, Andrew J. Blakeney 1993-02-23
5151340 Selected photoactive methylolated cyclohexanol compounds and their use in radiation-sensitive mixtures 1992-09-29