Issued Patents All Time
Showing 1–16 of 16 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7935665 | Non-corrosive cleaning compositions for removing etch residues | Vincent Leon, Michelle Elderkin | 2011-05-03 |
| 6855476 | Photoacid generators for use in photoresist compositions | Andrew J. Blakeney, Gregory Spaziano, Ognian N. Dimov, J. Thomas Kocab, John P. Hatfield | 2005-02-15 |
| 6380317 | Production of acetal derivatized hydroxyl aromatic polymers and their use in radiation sensitive formulations | Sanjay Malik, Andrew J. Blakeney, Joseph J. Sizensky, Brian Edison Maxwell | 2002-04-30 |
| 6312870 | t-butyl cinnamate polymers and their use in photoresist compositions | Sanjay Malik, Jeffrey Eisele, Whewell Allyn | 2001-11-06 |
| 6309793 | Production of acetal derivatized hydroxyl aromatic polymers and their use in radiation sensitive formulations | Sanjay Malik, Andrew J. Blakeney, Joseph J. Sizensky, Brian Edison Maxwell | 2001-10-30 |
| 6200480 | Method of purifying photoacid generators for use in photoresist compositions | Sanjay Malik | 2001-03-13 |
| 6159653 | Production of acetal derivatized hydroxyl aromatic polymers and their use in radiation sensitive formulations | Sanjay Malik, Andrew J. Blakeney, Joseph J. Sizensky, Brian Edison Maxwell | 2000-12-12 |
| 6140026 | Photosensitive diazonaphthoquinone esters based on selected cyclic alkyl ether-containing phenolics and their use in radiation sensitive mixtures | Andrew J. Blakeney, Arturo Norberto Medina, Medhat A. Toukhy, Alfred T. Jeffries, III, Ahmad A. Naiini | 2000-10-31 |
| 6133412 | Production of acetal derivatized hydroxyl aromatic polymers and their use in radiation sensitive formulations | Sanjay Malik, Andrew J. Blakeney, Joseph J. Sizensky, Brian Edison Maxwell | 2000-10-17 |
| 6040107 | Photosensitive diazonaphthoquinone esters based on selected cyclic alkyl ether-containing phenolics and their use in radiation sensitive mixtures | Andrew J. Blakeney, Arturo Norberto Medina, Medhat A. Toukhy, Alfred T. Jeffries, III, Ahmad A. Naiini | 2000-03-21 |
| 5602260 | Selected O-quinonediazide sulfonic acid esters of phenolic compounds and their use in radiation-sensitive compositions | Andrew J. Blakeney, Arturo Norberto Medina, Medhat A. Toukhy, Sobhy Tadros | 1997-02-11 |
| 5547814 | O-quinonediazide sulfonic acid esters of phenolic compounds and their use in forming positive images | Andrew J. Blakeney, Arturo Norberto Medina, Medhat A. Toukhy, Sobhy Tadros | 1996-08-20 |
| 5541033 | Selected o-quinonediazide sulfonic acid esters of phenolic compounds and their use in radiation-sensitive compositions | Andrew J. Blakeney, Arturo Norberto Medina, Medhat A. Toukhy, Sobhy Tadros | 1996-07-30 |
| 5446125 | Method for removing metal impurities from resist components | Kenji Honda, Edward A. Fitzgerald, IV | 1995-08-29 |
| 5234789 | Polylactide compounds as sensitivity enhancers for radiation sensitive mixtures containing o-quinonediazide photoactive compounds | James G. Favier, Jr., John McFarland | 1993-08-10 |
| 4711836 | Development of positive-working photoresist compositions | — | 1987-12-08 |