| 11939428 |
Polyimides |
Binod B. De, Sanjay Malik, William A. Reinerth, Ahmad A. Naiini, Raj Sakamuri |
2024-03-26 |
| 11899364 |
Photosensitive polyimide compositions |
Binod B. De, Sanjay Malik, Raj Sakamuri, William A. Reinerth, Ahmad A. Naiini |
2024-02-13 |
| 11782344 |
Photosensitive polyimide compositions |
Sanjay Malik, Raj Sakamuri, Binod B. De, William A. Reinerth, Ahmad A. Naiini |
2023-10-10 |
| 11721543 |
Planarizing process and composition |
Raj Sakamuri, Sanjay Malik, Michaela Connell, Ahmad A. Naiini, Stephanie Dilocker |
2023-08-08 |
| 11175582 |
Photosensitive stacked structure |
Sanjay Malik, Raj Sakamuri, Binod B. De, William A. Reinerth, Ahmad A. Naiini |
2021-11-16 |
| 11061327 |
Polyimides |
William A. Reinerth, Binod B. De, Sanjay Malik, Raj Sakamuri, Ahmad A. Naiini |
2021-07-13 |
| 10875965 |
Dielectric film forming composition |
Sanjay Malik, William A. Reinerth, Raj Sakamuri |
2020-12-29 |
| 10793676 |
Polyimides |
Sanjay Malik, William A. Reinerth, Binod B. De, Raj Sakamuri, Ahmad A. Naiini |
2020-10-06 |
| 10781341 |
Polyimide compositions |
Sanjay Malik, William A. Reinerth, Binod B. De |
2020-09-22 |
| 10696932 |
Cleaning composition |
Raj Sakamuri, Ahmad A. Naiini, Sanjay Malik, Binod B. De, William A. Reinerth |
2020-06-30 |
| 10345707 |
Stripping process |
Raj Sakamuri, Sanjay Malik |
2019-07-09 |
| 10036952 |
Photosensitive polyimide compositions |
Sanjay Malik, Raj Sakamuri, Binod B. De, William A. Reinerth, Ahmad A. Naiini |
2018-07-31 |
| 9034557 |
Chemically amplified positive photoresist composition |
Binod B. De |
2015-05-19 |
| 8535872 |
Thermally cured underlayer for lithographic application |
Binod B. De, Stephanie Dilocker |
2013-09-17 |
| 8153346 |
Thermally cured underlayer for lithographic application |
Binod B. De, Stephanie Dilocker |
2012-04-10 |
| 6916543 |
Copolymer, photoresist compositions thereof and deep UV bilayer system thereof |
Binod B. De, Sanjay Malik, Stephanie Dilocker |
2005-07-12 |
| 6855476 |
Photoacid generators for use in photoresist compositions |
Lawrence Ferreira, Andrew J. Blakeney, Gregory Spaziano, J. Thomas Kocab, John P. Hatfield |
2005-02-15 |