Issued Patents All Time
Showing 26–45 of 45 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5547814 | O-quinonediazide sulfonic acid esters of phenolic compounds and their use in forming positive images | Arturo Norberto Medina, Medhat A. Toukhy, Lawrence Ferreira, Sobhy Tadros | 1996-08-20 |
| 5541033 | Selected o-quinonediazide sulfonic acid esters of phenolic compounds and their use in radiation-sensitive compositions | Arturo Norberto Medina, Medhat A. Toukhy, Lawrence Ferreira, Sobhy Tadros | 1996-07-30 |
| 5302688 | Selected block phenolic oligomers and their use in phenolic resin compositions and in radiation-sensitive resist compositions | Alfred T. Jeffries, III, Kenji Honda, Sobhy Tadros | 1994-04-12 |
| 5234795 | Process of developing an image-wise exposed resist-coated substrate | Alfred T. Jeffries, III, Kenji Honda, Sobhy Tadros | 1993-08-10 |
| 5235022 | Selected block copolymer novolak binder resins | Alfred T. Jeffries, III, Kenji Honda, Sobhy Tadros | 1993-08-10 |
| 5232819 | Selected block phenolic oligomers and their use in phenolic resin compositions and in radiation-sensitive resist compositions | Alfred T. Jeffries, III, Kenji Honda, Sobhy Tadros | 1993-08-03 |
| 5196289 | Selected block phenolic oligomers and their use in radiation-sensitive resist compositions | Alfred T. Jeffries, III, Kenji Honda, Sobhy Tadros | 1993-03-23 |
| 5188921 | Selected block copolymer novolak binder resins in radiation-sensitive resist compositions | Alfred T. Jeffries, III, Kenji Honda, Sobhy Tadros | 1993-02-23 |
| 5164286 | Photoresist developer containing fluorinated amphoteric surfactant | Robert F. Rogler, Medhat A. Toukhy, David Brzozowy | 1992-11-17 |
| 5053479 | Thermally stable phenolic resin compositions and their use in light-sensitive compositions | Thomas R. Sarubbi, Joseph J. Sizensky | 1991-10-01 |
| 5024921 | Thermally stable light-sensitive compositions with o-quinone diazide and phenolic resin used in a method of forming a positive photoresist image | Alfred T. Jeffries, III, Thomas R. Sarubbi | 1991-06-18 |
| 5001040 | Process of forming resist image in positive photoresist with thermally stable phenolic resin | Thomas R. Sarubbi, Joseph J. Sizensky | 1991-03-19 |
| 4992356 | Process of developing a radiation imaged product with trinuclear novolak oligomer having o-naphthoquinone diazide sulfonyl group | Alfred T. Jeffries, III, Medhat A. Toukhy | 1991-02-12 |
| 4992596 | Selected trinuclear novolak oligomers and their use in photoactive compounds and radiation sensitive mixtures | Alfred T. Jeffries, III, Medhat A. Toukhy | 1991-02-12 |
| 4970287 | Thermally stable phenolic resin compositions with ortho, ortho methylene linkage | Alfred T. Jeffries, III, Thomas R. Sarubbi | 1990-11-13 |
| 4959292 | Light-sensitive o-quinone diazide composition and product with phenolic novolak prepared by condensation with haloacetoaldehyde | Thomas R. Sarubbi, Joseph J. Sizensky | 1990-09-25 |
| 4957846 | Radiation sensitive compound and mixtures with trinuclear novolak oligomer with o-naphthoquinone diazide sulfonyl group | Alfred T. Jeffries, III, Medhat A. Toukhy | 1990-09-18 |
| 4837121 | Thermally stable light-sensitive compositions with o-quinone diazide and phenolic resin | Alfred T. Jeffries, III, Thomas R. Sarubbi | 1989-06-06 |
| 4710449 | High contrast low metal ion positive photoresist developing method using aqueous base solutions with surfactants | James M. Lewis | 1987-12-01 |
| 4661436 | Process of forming high contrast resist pattern in positive photoagent material using alkalai developer with fluorocarbon surfactant | James M. Lewis, Robert A. Owens | 1987-04-28 |