Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9012126 | Positive photosensitive material | Weihong Liu, PingHung Lu, Chunwei Chen, Medhat A. Toukhy, SookMee Lai | 2015-04-21 |
| 6852465 | Photoresist composition for imaging thick films | Ralph R. Dammel, Mark A. Spak | 2005-02-08 |
| 6355735 | Semi-interpenetrating polymer network from epoxy monomer and olefin | Mark I. Wagner | 2002-03-12 |