Issued Patents All Time
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6852465 | Photoresist composition for imaging thick films | Ralph R. Dammel, Stephen Meyer | 2005-02-08 |
| 6372414 | Lift-off process for patterning fine metal lines | Randy D. Redd, Ralph R. Dammel, John P. Sagan | 2002-04-16 |
| 6187506 | Antireflective coating for photoresist compositions | Shuji Ding, Dinesh N. Khanna, Dana L. Durham, Jianhui Shan, Eleazer Gonzalez | 2001-02-13 |
| 5922503 | Process for obtaining a lift-off imaging profile | Ralph R. Dammel, Michael Deprado | 1999-07-13 |
| 5399456 | Image reversal negative working photoresist containing O-quinone diazide and cross-linking compound | Donald Mammato, Dana L. Durham, Sangya Jain | 1995-03-21 |
| 5324430 | High performance pan composite membranes | Tai-Shung Chung, E. Ronald Kafchinski, Brenda Bembry-Ross, C. Glen Wensley | 1994-06-28 |
| 5256522 | Image reversal negative working O-naphthoquinone diazide and cross-linking compound containing photoresist process with thermal curing | Donald Mammato, Dana L. Durham, Sangya Jain | 1993-10-26 |
| 5217840 | Image reversal negative working o-quinone diazide and cross-linking compound containing photoresist process with thermal curing treatment and element produced therefrom | Donald Mammato, Dana L. Durham, Sangya Jain | 1993-06-08 |
| 5019488 | Method of producing an image reversal negative photoresist having a photo-labile blocked imide | Donald Mammato, Sangya Jain, Dana L. Durham, Douglas A. Usifer, Michael J. McFarland | 1991-05-28 |
| 4931381 | Image reversal negative working O-quinone diazide and cross-linking compound containing photoresist process with thermal curing treatment | Donald Mammato, Dana L. Durham, Sangya Jain | 1990-06-05 |
| 4929536 | Image reversal negative working O-napthoquinone diazide and cross-linking compound containing photoresist process with thermal curing | Donald Mammato, Dana L. Durham, Sangya Jain | 1990-05-29 |
| 4885232 | High temperature post exposure baking treatment for positive photoresist compositions | — | 1989-12-05 |
| 4297393 | Method of applying thin metal deposits to a substrate | Richard Denning, Barry Polhemus | 1981-10-27 |
| 4220706 | Etchant solution containing HF-HnO.sub.3 -H.sub.2 SO.sub.4 -H.sub.2 O.sub.2 | — | 1980-09-02 |