| 6852465 |
Photoresist composition for imaging thick films |
Ralph R. Dammel, Stephen Meyer |
2005-02-08 |
| 6372414 |
Lift-off process for patterning fine metal lines |
Randy D. Redd, Ralph R. Dammel, John P. Sagan |
2002-04-16 |
| 6187506 |
Antireflective coating for photoresist compositions |
Shuji Ding, Dinesh N. Khanna, Dana L. Durham, Jianhui Shan, Eleazer Gonzalez |
2001-02-13 |
| 5922503 |
Process for obtaining a lift-off imaging profile |
Ralph R. Dammel, Michael Deprado |
1999-07-13 |
| 5399456 |
Image reversal negative working photoresist containing O-quinone diazide and cross-linking compound |
Donald Mammato, Dana L. Durham, Sangya Jain |
1995-03-21 |
| 5324430 |
High performance pan composite membranes |
Tai-Shung Chung, E. Ronald Kafchinski, Brenda Bembry-Ross, C. Glen Wensley |
1994-06-28 |
| 5256522 |
Image reversal negative working O-naphthoquinone diazide and cross-linking compound containing photoresist process with thermal curing |
Donald Mammato, Dana L. Durham, Sangya Jain |
1993-10-26 |
| 5217840 |
Image reversal negative working o-quinone diazide and cross-linking compound containing photoresist process with thermal curing treatment and element produced therefrom |
Donald Mammato, Dana L. Durham, Sangya Jain |
1993-06-08 |
| 5019488 |
Method of producing an image reversal negative photoresist having a photo-labile blocked imide |
Donald Mammato, Sangya Jain, Dana L. Durham, Douglas A. Usifer, Michael J. McFarland |
1991-05-28 |
| 4931381 |
Image reversal negative working O-quinone diazide and cross-linking compound containing photoresist process with thermal curing treatment |
Donald Mammato, Dana L. Durham, Sangya Jain |
1990-06-05 |
| 4929536 |
Image reversal negative working O-napthoquinone diazide and cross-linking compound containing photoresist process with thermal curing |
Donald Mammato, Dana L. Durham, Sangya Jain |
1990-05-29 |
| 4885232 |
High temperature post exposure baking treatment for positive photoresist compositions |
— |
1989-12-05 |
| 4297393 |
Method of applying thin metal deposits to a substrate |
Richard Denning, Barry Polhemus |
1981-10-27 |
| 4220706 |
Etchant solution containing HF-HnO.sub.3 -H.sub.2 SO.sub.4 -H.sub.2 O.sub.2 |
— |
1980-09-02 |