DM

Donald Mammato

HC Hoechst Celanese: 6 patents #107 of 871Top 15%
AH American Hoechst: 2 patents #34 of 142Top 25%
📍 Lebanon, NJ: #48 of 221 inventorsTop 25%
🗺 New Jersey: #11,005 of 69,400 inventorsTop 20%
Overall (All Time): #669,103 of 4,157,543Top 20%
8
Patents All Time

Issued Patents All Time

Showing 1–8 of 8 patents

Patent #TitleCo-InventorsDate
5399456 Image reversal negative working photoresist containing O-quinone diazide and cross-linking compound Mark A. Spak, Dana L. Durham, Sangya Jain 1995-03-21
5256522 Image reversal negative working O-naphthoquinone diazide and cross-linking compound containing photoresist process with thermal curing Mark A. Spak, Dana L. Durham, Sangya Jain 1993-10-26
5217840 Image reversal negative working o-quinone diazide and cross-linking compound containing photoresist process with thermal curing treatment and element produced therefrom Mark A. Spak, Dana L. Durham, Sangya Jain 1993-06-08
5019488 Method of producing an image reversal negative photoresist having a photo-labile blocked imide Sangya Jain, Dana L. Durham, Mark A. Spak, Douglas A. Usifer, Michael J. McFarland 1991-05-28
4931381 Image reversal negative working O-quinone diazide and cross-linking compound containing photoresist process with thermal curing treatment Mark A. Spak, Dana L. Durham, Sangya Jain 1990-06-05
4929536 Image reversal negative working O-napthoquinone diazide and cross-linking compound containing photoresist process with thermal curing Mark A. Spak, Dana L. Durham, Sangya Jain 1990-05-29
4596763 Positive photoresist processing with mid U-V range exposure John DiCarlo, Jonas O. St. Alban, Bruce M. Stevens 1986-06-24
4588670 Light-sensitive trisester of O-quinone diazide containing composition for the preparation of a positive-acting photoresist Michael G. Kelly, Dana L. Durham, Sangya Jain, Lawrence N. Crane 1986-05-13