Issued Patents All Time
Showing 1–25 of 39 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7687447 | Semi-aqueous stripping and cleaning composition containing aminobenzenesulfonic acid | Matthew I. Egbe, Michael Walter Legenza | 2010-03-30 |
| 6951710 | Compositions suitable for removing photoresist, photoresist byproducts and etching residue, and use thereof | Jennifer Rieker, Thomas Wieder | 2005-10-04 |
| 6821352 | Compositions for removing etching residue and use thereof | Roberto Rovito, David Barry Rennie | 2004-11-23 |
| 6677286 | Compositions for removing etching residue and use thereof | Roberto Rovito, David Barry Rennie | 2004-01-13 |
| 6368421 | Composition for stripping photoresist and organic materials from substrate surfaces | Joseph E. Oberlander, Mark Steven Slezak, Dinesh N. Khanna, Lawrence F. Spinicelli | 2002-04-09 |
| 6187506 | Antireflective coating for photoresist compositions | Shuji Ding, Dinesh N. Khanna, Mark A. Spak, Jianhui Shan, Eleazer Gonzalez | 2001-02-13 |
| 6106995 | Antireflective coating material for photoresists | Sunit S. Dixit, M. Dalil Rahman, Dinesh N. Khanna, Joseph E. Oberlander | 2000-08-22 |
| 5994430 | Antireflective coating compositions for photoresist compositions and use thereof | Shuji Ding, Ping-Hung Lu, Dinesh N. Khanna, Jianhui Shan, Ralph R. Dammel +1 more | 1999-11-30 |
| 5981145 | Light absorbing polymers | Shuji Ding, Dinesh N. Khanna, Ping-Hung Lu, Jianhui Shan, Ralph R. Dammel +2 more | 1999-11-09 |
| 5876897 | Positive photoresists containing novel photoactive compounds | Ping-Hung Lu, Joseph E. Oberlander, Dinesh N. Khanna | 1999-03-02 |
| 5866295 | Photosensitive quinolone compounds and a process of preparation | Joseph E. Oberlander, Dinesh N. Khanna | 1999-02-02 |
| 5733714 | Antireflective coating for photoresist compositions | Iain McCulloch, Ralph R. Dammel, Anthony J. Corso, Shuji Ding, Ping-Hung Lu +2 more | 1998-03-31 |
| 5688893 | Method of using a Lewis base to control molecular weight of novolak resins | M. Dalil Rahman, Daniel P. Aubin, Ralph R. Dammel | 1997-11-18 |
| 5665517 | Acidic ion exchange resin as a catalyst to synthesize a novolak resin and photoresist composition therefrom | M. Dalil Rahman, Daniel P. Aubin, Elaine G. Kokinda | 1997-09-09 |
| 5652297 | Aqueous antireflective coatings for photoresist compositions | Iain McCulloch, Ralph R. Dammel, Ping-Hung Lu, Ming Kang, Dinesh N. Khanna +1 more | 1997-07-29 |
| 5652317 | Antireflective coatings for photoresist compositions | Iain McCulloch, Ralph R. Dammel, Ping-Hung Lu | 1997-07-29 |
| 5646218 | Novolak resin blends for photoresist applications | Thomas J. Lynch, Chester J. Sobodacha | 1997-07-08 |
| 5624789 | Metal ion reduction in top anti-reflective coatings for photoresisis | M. Dalil Rahman | 1997-04-29 |
| 5614349 | Using a Lewis base to control molecular weight of novolak resins | M. Dalil Rahman, Daniel P. Aubin, Ralph R. Dammel | 1997-03-25 |
| 5594098 | Metal ion reduction in novolak resins and photoresists | M. Dalil Rahman | 1997-01-14 |
| 5580949 | Metal ion reduction in novolak resins and photoresists | M. Dalil Rahman | 1996-12-03 |
| 5543263 | Photoresist having a low level of metal ions | M. Dalil Rahman | 1996-08-06 |
| 5516886 | Metal ion reduction in top anti-reflective coatings for photoresists | M. Dalil Rahman | 1996-05-14 |
| 5476750 | Metal ion reduction in the raw materials and using a Lewis base to control molecular weight of novolak resin to be used in positive photoresists | M. Dalil Rahman, Ping-Hung Lu, Daniel P. Aubin, Ralph R. Dammel | 1995-12-19 |
| 5399456 | Image reversal negative working photoresist containing O-quinone diazide and cross-linking compound | Mark A. Spak, Donald Mammato, Sangya Jain | 1995-03-21 |