Issued Patents All Time
Showing 26–39 of 39 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5374693 | Novolak resin blends for photoresist applications | Thomas J. Lynch, Chester J. Sobodacha | 1994-12-20 |
| 5286606 | Process for producing a developer having a low metal ion level | M. Dalil Rahman | 1994-02-15 |
| 5256522 | Image reversal negative working O-naphthoquinone diazide and cross-linking compound containing photoresist process with thermal curing | Mark A. Spak, Donald Mammato, Sangya Jain | 1993-10-26 |
| 5248585 | Polyphosphazene binder resins for photoresists comprising as photosensitizers o-quinone diazide esters | Thomas J. Lynch, Chester J. Sobodacha | 1993-09-28 |
| 5217840 | Image reversal negative working o-quinone diazide and cross-linking compound containing photoresist process with thermal curing treatment and element produced therefrom | Mark A. Spak, Donald Mammato, Sangya Jain | 1993-06-08 |
| 5039594 | Positive photoresist containing a mixture of propylene glycol alkyl ethers and propylene glycol alkyl ether acetate | — | 1991-08-13 |
| 5019488 | Method of producing an image reversal negative photoresist having a photo-labile blocked imide | Donald Mammato, Sangya Jain, Mark A. Spak, Douglas A. Usifer, Michael J. McFarland | 1991-05-28 |
| 4983490 | Photoresist treating composition consisting of a mixture of propylene glycol alkyl ether and propylene glycol alkyl ether acetate | — | 1991-01-08 |
| 4948697 | Positive photoresist with a solvent mixture of propylene glycol alkyl ether and propylene glycol alkyl ether acetate | — | 1990-08-14 |
| 4931381 | Image reversal negative working O-quinone diazide and cross-linking compound containing photoresist process with thermal curing treatment | Mark A. Spak, Donald Mammato, Sangya Jain | 1990-06-05 |
| 4929536 | Image reversal negative working O-napthoquinone diazide and cross-linking compound containing photoresist process with thermal curing | Mark A. Spak, Donald Mammato, Sangya Jain | 1990-05-29 |
| 4806458 | Composition containing a mixture of hexa-alkyl disilazane and propylene glycol alkyl ether and/or propylene glycol alkyl ether acetate | — | 1989-02-21 |
| 4692398 | Process of using photoresist treating composition containing a mixture of a hexa-alkyl disilazane, propylene glycol alkyl ether and propylene glycol alkyl ether acetate | — | 1987-09-08 |
| 4588670 | Light-sensitive trisester of O-quinone diazide containing composition for the preparation of a positive-acting photoresist | Michael G. Kelly, Donald Mammato, Sangya Jain, Lawrence N. Crane | 1986-05-13 |