Issued Patents All Time
Showing 1–17 of 17 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6106995 | Antireflective coating material for photoresists | M. Dalil Rahman, Dinesh N. Khanna, Joseph E. Oberlander, Dana L. Durham | 2000-08-22 |
| 5976761 | Fractionation of phenol formaldehyde condensate and photoresist compositions produced therefrom | M. Dalil Rahman, Daniel P. Aubin, Dinesh N. Khanna | 1999-11-02 |
| 5928836 | Fractionated novolak resin copolymer and photoresist composition therefrom | M. Dalil Rahman, Stanley F. Wanat, Michelle Cook, Douglas McKenzie | 1999-07-27 |
| 5853947 | Quinonediazide positive photoresist utilizing mixed solvent consisting essentially of 3-methyl-3-methoxy butanol and propylene glycol alkyl ether acetate | Stanley F. Wanat, M. Dalil Rahman, Dinesh N. Khanna, Daniel P. Aubin | 1998-12-29 |
| 5739265 | Fractionation of phenol formaldehyde condensate and photoresist compositions produced therefrom | M. Dalil Rahman, Daniel P. Aubin, Dinesh N. Khanna | 1998-04-14 |
| 5719004 | Positive photoresist composition containing a 2,4-dinitro-1-naphthol | Ping-Hung Lu, Ralph R. Dammel, Elaine G. Kokinda | 1998-02-17 |
| 5693749 | Fractionation of phenol formaldehyde condensate and photoresist compositions produced therefrom | M. Dalil Rahman, Daniel P. Aubin, Dinesh N. Khanna | 1997-12-02 |
| 5225312 | Positive photoresist containing dyes | Richard M. Lazarus, Thomas P. Carter, Joseph E. Oberlander, Andreas Goehring, Randall W. Kautz +1 more | 1993-07-06 |
| 5208138 | High contrast high thermal stability positive photoresists having novolak resins of lowered hydroxyl content | Richard M. Lazarus, Randall Kautz | 1993-05-04 |
| 5182184 | Novolak resins of lowered hydroxyl content and high contrast high thermal stability positive photoresists prepared therefrom | Richard M. Lazarus, Randall Kautz | 1993-01-26 |
| 5130409 | Mixed aldehyde novolak resins useful as high contrast high thermal stability positive photoresists | Richard M. Lazarus, Randall Kautz | 1992-07-14 |
| 4997734 | Method of forming a thermally stable mixed aldehyde novolak resin containing resist pattern and that pattern on a substrate | Richard M. Lazarus, Randall Kautz | 1991-03-05 |
| 4996122 | Method of forming resist pattern and thermally stable and highly resolved resist pattern | Richard M. Lazarus, Edward J. Reardon | 1991-02-26 |
| 4943511 | High sensitivity mid and deep UV resist | Richard M. Lazarus, Edward J. Reardon | 1990-07-24 |
| 4920028 | High contrast high thermal stability positive photoresists with mixed cresol and hydroxybenzaldehyde prepared novolak and photosensitive diazoquinone | Richard M. Lazarus, Randall Kautz | 1990-04-24 |
| 4400481 | Finisher and preserver for lithographic plates | William V. Stansky, Jr. | 1983-08-23 |
| 4399243 | Cleaner and scratch remover composition | Daniel C. Thomas | 1983-08-16 |