ER

Edward J. Reardon

MI Morton International: 6 patents #65 of 580Top 15%
DY Dynachem: 2 patents #2 of 8Top 25%
MT Morton Thiokol: 1 patents #77 of 221Top 35%
SL Shipley Company, L.L.C.: 1 patents #226 of 401Top 60%
🗺 California: #55,401 of 386,348 inventorsTop 15%
Overall (All Time): #472,856 of 4,157,543Top 15%
11
Patents All Time

Issued Patents All Time

Showing 1–11 of 11 patents

Patent #TitleCo-InventorsDate
6329123 Photoimageable compositions having improved flexibility and stripping ability Daniel E. Lundy, Robert K. Barr 2001-12-11
6322951 Photoimageable compositions having improved flexibility and stripping ability Daniel E. Lundy, Robert K. Barr 2001-11-27
6166245 Photoimageable compositions having improved chemical resistance and stripping ability Daniel E. Lundy, Robert K. Barr 2000-12-26
6054252 Photoimageable compositions having improved chemical resistance and stripping ability Daniel E. Lundy, Robert K. Barr 2000-04-25
6045973 Photoimageable compositions having improved chemical resistance and stripping ability Daniel E. Lundy, Robert K. Barr 2000-04-04
5698376 Method of producing a resist pattern by contact imaging a photoimageable composition providing a tack-free surface James J. Briguglio, Charles R. Keil, Vinai Ming Tara, Randall W. Kautz 1997-12-16
5609991 Photoimageable composition having improved alkaline process resistance and tack-free surface for contact imaging James J. Briguglio, Charles R. Keil, Vinai Ming Tara, Randall W. Kautz 1997-03-11
4996122 Method of forming resist pattern and thermally stable and highly resolved resist pattern Richard M. Lazarus, Sunit S. Dixit 1991-02-26
4943511 High sensitivity mid and deep UV resist Richard M. Lazarus, Sunit S. Dixit 1990-07-24
4552830 Carbonylic halides as activators for phototropic compositions Melvin A. Lipson 1985-11-12
4343885 Phototropic photosensitive compositions containing fluoran colorformer 1982-08-10