Issued Patents All Time
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9562000 | Amino alcohol treatment for sol-gel conversion coatings, substrates including the same, and methods of making the substrates | Richard Albers | 2017-02-07 |
| 6971429 | Conveyorized vacuum applicator and method of applying a dry film resist to a printed circuit board | Osvaldo Novello, Roberto Stanich | 2005-12-06 |
| 6679307 | Conveyorized vacuum applicator and method of applying a dry film resist to a printed circuit board | Osvaldo Novello | 2004-01-20 |
| 6610459 | Conveyorized vacuum applicator and method of applying a dry film resist to a printed circuit board | Osvaldo Novello, Roberto Stanich | 2003-08-26 |
| 6585837 | Conveyorized vacuum applicator and method of applying a dry film resist to a printed circuit board | Osvaldo Novello | 2003-07-01 |
| 5773518 | Esterified styrene/maleic anhydride polymer | Randall W. Kautz | 1998-06-30 |
| 5698370 | Esterified styrene/maleic anhydride polymer and polymer-containing photoimageable composition having improved alkaline process resistance | Randall W. Kautz | 1997-12-16 |
| 5698376 | Method of producing a resist pattern by contact imaging a photoimageable composition providing a tack-free surface | James J. Briguglio, Vinai Ming Tara, Edward J. Reardon, Randall W. Kautz | 1997-12-16 |
| 5609991 | Photoimageable composition having improved alkaline process resistance and tack-free surface for contact imaging | James J. Briguglio, Vinai Ming Tara, Edward J. Reardon, Randall W. Kautz | 1997-03-11 |
| 5576145 | Esterified styrene/maleic anhydride polymer and polymer-containing photoimageable composition having improved alkaline process resistance | Randall W. Kautz | 1996-11-19 |