Issued Patents All Time
Showing 1–18 of 18 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10351724 | Coating systems and formulations with high hide and holdout | John Joecken, Caidian Luo | 2019-07-16 |
| 8501863 | Paint | Caidian Luo | 2013-08-06 |
| 8188752 | Yield improvement for Josephson junction test device formation | Mark B. Ketchen, Shwetank Kumar, Matthias Steffen, Christopher B. Lirakis | 2012-05-29 |
| 6107367 | Traffic stripe composition | Amelia M. Nucup | 2000-08-22 |
| 5342734 | Deep UV sensitive photoresist resistant to latent image decay | John Grunwald, Chava Gal, Shulamit Hirsch | 1994-08-30 |
| 5314782 | Deep UV sensitive resistant to latent image decay comprising a diazonaphthoquinone sulfonate of a nitrobenzyl derivative | Thomas A. Koes | 1994-05-24 |
| 5225312 | Positive photoresist containing dyes | Sunit S. Dixit, Thomas P. Carter, Joseph E. Oberlander, Andreas Goehring, Randall W. Kautz +1 more | 1993-07-06 |
| 5208138 | High contrast high thermal stability positive photoresists having novolak resins of lowered hydroxyl content | Randall Kautz, Sunit S. Dixit | 1993-05-04 |
| 5182184 | Novolak resins of lowered hydroxyl content and high contrast high thermal stability positive photoresists prepared therefrom | Randall Kautz, Sunit S. Dixit | 1993-01-26 |
| 5130409 | Mixed aldehyde novolak resins useful as high contrast high thermal stability positive photoresists | Randall Kautz, Sunit S. Dixit | 1992-07-14 |
| 5126230 | High contrast, positive photoresist developer containing alkanolamine | Kenneth L. Bell, Carla M. Bauer | 1992-06-30 |
| 5094934 | Method of developing a high contrast, positive photoresist using a developer containing alkanolamine | Kenneth L. Bell, Carla M. Bauer | 1992-03-10 |
| 4997734 | Method of forming a thermally stable mixed aldehyde novolak resin containing resist pattern and that pattern on a substrate | Randall Kautz, Sunit S. Dixit | 1991-03-05 |
| 4996122 | Method of forming resist pattern and thermally stable and highly resolved resist pattern | Edward J. Reardon, Sunit S. Dixit | 1991-02-26 |
| 4943511 | High sensitivity mid and deep UV resist | Edward J. Reardon, Sunit S. Dixit | 1990-07-24 |
| 4920028 | High contrast high thermal stability positive photoresists with mixed cresol and hydroxybenzaldehyde prepared novolak and photosensitive diazoquinone | Randall Kautz, Sunit S. Dixit | 1990-04-24 |
| 4808513 | Method of developing a high contrast, positive photoresist using a developer containing alkanolamine | Kenneth L. Bell, Carla M. Bauer | 1989-02-28 |
| 4568027 | Fluid spray-forming device | — | 1986-02-04 |