Issued Patents All Time
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5208138 | High contrast high thermal stability positive photoresists having novolak resins of lowered hydroxyl content | Richard M. Lazarus, Sunit S. Dixit | 1993-05-04 |
| 5182184 | Novolak resins of lowered hydroxyl content and high contrast high thermal stability positive photoresists prepared therefrom | Richard M. Lazarus, Sunit S. Dixit | 1993-01-26 |
| 5130409 | Mixed aldehyde novolak resins useful as high contrast high thermal stability positive photoresists | Richard M. Lazarus, Sunit S. Dixit | 1992-07-14 |
| 4997734 | Method of forming a thermally stable mixed aldehyde novolak resin containing resist pattern and that pattern on a substrate | Richard M. Lazarus, Sunit S. Dixit | 1991-03-05 |
| 4920028 | High contrast high thermal stability positive photoresists with mixed cresol and hydroxybenzaldehyde prepared novolak and photosensitive diazoquinone | Richard M. Lazarus, Sunit S. Dixit | 1990-04-24 |