Issued Patents All Time
Showing 1–22 of 22 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8088548 | Bottom antireflective coating compositions | Francis Houlihan, Shinji Miyazaki, Mark Neisser, Alberto D. Dioses | 2012-01-03 |
| 8039202 | Positive-working photoimageable bottom antireflective coating | Yu Sui, Hengpeng Wu, Wenbing Kang, Mark Neisser, Tomohide KATAYAMA +3 more | 2011-10-18 |
| 7824837 | Positive-working photoimageable bottom antireflective coating | Hengpeng Wu, Mark Neisser, Shuji Ding-Lee, Aritaka Hishida, Medhat Toukhy | 2010-11-02 |
| 7754414 | Antireflective coating compositions | — | 2010-07-13 |
| 7601482 | Negative photoresist compositions | Georg Pawlowski, Chunwei Chen, Robert Plass | 2009-10-13 |
| 7264913 | Antireflective compositions for photoresists | Hengpeng Wu, Shuji Ding-Lee, Zhong Xiang, Mark Neisser, Eleazar Gonzalez +1 more | 2007-09-04 |
| 7078157 | Photosensitive composition and use thereof | Hong Zhuang, Ping-Hung Lu, Stanely F. Wanat, Robert Plass | 2006-07-18 |
| 7070914 | Process for producing an image using a first minimum bottom antireflective coating composition | Mark Neisser, Medhat A. Toukhy, Raj Sakamuri, Shuji Ding-Lee | 2006-07-04 |
| 6911293 | Photoresist compositions comprising acetals and ketals as solvents | Stanley F. Wanat, Robert Plass, Douglas McKenzie | 2005-06-28 |
| 6844131 | Positive-working photoimageable bottom antireflective coating | Ralph R. Dammel, Shuji Ding-Lee, Mark Neisser, Medhat A. Toukhy | 2005-01-18 |
| 6531267 | Process for producing acid sensitive liquid composition containing a carbonate | — | 2003-03-11 |
| 6524775 | Edge bead remover for thick film photoresists | Craig Traynor, Ernesto S. Sison, Jeff Griffin | 2003-02-25 |
| 6368421 | Composition for stripping photoresist and organic materials from substrate surfaces | Mark Steven Slezak, Dinesh N. Khanna, Dana L. Durham, Lawrence F. Spinicelli | 2002-04-09 |
| 6114085 | Antireflective composition for a deep ultraviolet photoresist | Munirathna Padmanaban, Ralph R. Dammel, Stanley A. Ficner, John P. Sagan | 2000-09-05 |
| 6106995 | Antireflective coating material for photoresists | Sunit S. Dixit, M. Dalil Rahman, Dinesh N. Khanna, Dana L. Durham | 2000-08-22 |
| 6077942 | Process of controlling particle size of naphthoquinone diazide esters | — | 2000-06-20 |
| 6048665 | Process for making a photoactive compound and photoresist therefrom | — | 2000-04-11 |
| 6017766 | Process for measuring concentration of nonionic surfactants in an aqueous alkaline solution | Rodica Holt, Eleazar Gonzalez, Pilarcita Ranque, Maria F. Y. Calindas | 2000-01-25 |
| 5936071 | Process for making a photoactive compound and photoresist therefrom | — | 1999-08-10 |
| 5876897 | Positive photoresists containing novel photoactive compounds | Dana L. Durham, Ping-Hung Lu, Dinesh N. Khanna | 1999-03-02 |
| 5866295 | Photosensitive quinolone compounds and a process of preparation | Dana L. Durham, Dinesh N. Khanna | 1999-02-02 |
| 5225312 | Positive photoresist containing dyes | Sunit S. Dixit, Richard M. Lazarus, Thomas P. Carter, Andreas Goehring, Randall W. Kautz +1 more | 1993-07-06 |