Issued Patents All Time
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8039202 | Positive-working photoimageable bottom antireflective coating | Yu Sui, Hengpeng Wu, Wenbing Kang, Mark Neisser, Tomohide KATAYAMA +3 more | 2011-10-18 |
| 7824837 | Positive-working photoimageable bottom antireflective coating | Hengpeng Wu, Mark Neisser, Aritaka Hishida, Joseph E. Oberlander, Medhat Toukhy | 2010-11-02 |
| 7691556 | Antireflective compositions for photoresists | Hengpeng Wu, Zhong Xiang, Aritaka Hishida, Jianhui Shan, Hong Zhuang | 2010-04-06 |
| 7470500 | Organic bottom antireflective polymer compositions | Huirong Yao | 2008-12-30 |
| 7264913 | Antireflective compositions for photoresists | Hengpeng Wu, Zhong Xiang, Joseph E. Oberlander, Mark Neisser, Eleazar Gonzalez +1 more | 2007-09-04 |
| 7081511 | Process for making polyesters | Hengpeng Wu, Jianhui Shan, Zhong Xhiang, Eleazor B. Gonzalez, Mark Neisser | 2006-07-25 |
| 7070914 | Process for producing an image using a first minimum bottom antireflective coating composition | Mark Neisser, Joseph E. Oberlander, Medhat A. Toukhy, Raj Sakamuri | 2006-07-04 |
| 7030201 | Bottom antireflective coatings | Huirong Yao, Hengpeng Wu, Zhong Xiang | 2006-04-18 |
| 7008476 | Modified alginic acid of alginic acid derivatives and thermosetting anti-reflective compositions thereof | Hengpeng Wu, Zhong Xhiang, Jianhui Shan, Eleazar Gonzalez | 2006-03-07 |
| 6844131 | Positive-working photoimageable bottom antireflective coating | Joseph E. Oberlander, Ralph R. Dammel, Mark Neisser, Medhat A. Toukhy | 2005-01-18 |