Issued Patents All Time
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8618002 | Resist pattern formating method | Xiaowei Wang, Yuriko Matsuura | 2013-12-31 |
| 8039202 | Positive-working photoimageable bottom antireflective coating | Yu Sui, Hengpeng Wu, Mark Neisser, Tomohide KATAYAMA, Shuji Ding-Lee +3 more | 2011-10-18 |
| 7923200 | Composition for coating over a photoresist pattern comprising a lactam | Muthiah Thiyagarajan, Ralph R. Dammel, Yi Cao, SungEun Hong, Clement Anyadiegwu | 2011-04-12 |