Issued Patents All Time
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11914296 | Ethynyl derived composite, a composition comprising thereof, a method for manufacturing a coating by it, and a method for manufacturing a device comprising the coating | Shigemasa Nakasugi, Yusuke Hama, Hiroshi Yanagita, Takashi Sekito | 2024-02-27 |
| 11609498 | Ethynyl derived composite, a composition comprising thereof, a method for manufacturing a coating by it, and a method for manufacturing a device comprising the coating | Shigemasa Nakasugi, Yusuke Hama, Hiroshi Yanagita, Takashi Sekito | 2023-03-21 |
| 11450805 | Compound, semiconductor material, and methods for manufacturing coating and semiconductor using the same | Shigemasa Nakasugi, Hiroshi Yanagita, Kazunori Kurosawa, Takashi Sekito, Yusuke Hama | 2022-09-20 |
| 11366389 | Allyloxy derivative, resist underlayer forming composition using the same, and method of manufacturing resist underlayer and semiconductor device using the same | Shigemasa Nakasugi, Hiroshi Yanagita, Takashi Sekito, Yusuke Hama | 2022-06-21 |
| 10451974 | Rinse composition, a method for forming resist patterns and a method for making semiconductor devices | Kazuma Yamamoto, Tomoyasu YASHIMA, Tatsuro Nagahara | 2019-10-22 |
| 9494867 | Rinsing liquid for lithography and pattern forming method using same | Sara Tsuyuki, Go Noya | 2016-11-15 |
| 9298095 | Rinse solution for lithography and pattern formation method employing the same | Xiaowei Wang, Georg Pawlowski | 2016-03-29 |
| 8618002 | Resist pattern formating method | Wenbing Kang, Xiaowei Wang | 2013-12-31 |