Issued Patents All Time
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12242195 | Method for manufacturing cured film and use of the same | Shigemasa Nakasugi, Hiroshi Yanagita, Taku Hirayama | 2025-03-04 |
| 11914296 | Ethynyl derived composite, a composition comprising thereof, a method for manufacturing a coating by it, and a method for manufacturing a device comprising the coating | Shigemasa Nakasugi, Yusuke Hama, Hiroshi Yanagita, Yuriko Matsuura | 2024-02-27 |
| 11767398 | Spin-on compositions comprising an inorganic oxide component and an alkynyloxy substituted spin-on carbon component useful as hard masks and filling materials with improved shelf life | M. Dalil Rahman | 2023-09-26 |
| 11609498 | Ethynyl derived composite, a composition comprising thereof, a method for manufacturing a coating by it, and a method for manufacturing a device comprising the coating | Shigemasa Nakasugi, Yusuke Hama, Hiroshi Yanagita, Yuriko Matsuura | 2023-03-21 |
| 11450805 | Compound, semiconductor material, and methods for manufacturing coating and semiconductor using the same | Shigemasa Nakasugi, Hiroshi Yanagita, Kazunori Kurosawa, Yusuke Hama, Yuriko Matsuura | 2022-09-20 |
| 11366389 | Allyloxy derivative, resist underlayer forming composition using the same, and method of manufacturing resist underlayer and semiconductor device using the same | Shigemasa Nakasugi, Hiroshi Yanagita, Yusuke Hama, Yuriko Matsuura | 2022-06-21 |
| 9921481 | Fine resist pattern-forming composition and pattern forming method using same | Kazuma Yamamoto, Yoshihiro Miyamoto, Tatsuro Nagahara | 2018-03-20 |
| 9448485 | Composition for forming fine resist pattern and pattern forming method using same | Tetsuo Okayasu, Masahiro Ishii | 2016-09-20 |
| 9411232 | Composition for forming fine resist pattern, and pattern formation method using same | Tatsuro Nagahara, Kazuma Yamamoto, Masakazu Kobayashi, Noboru Satake, Masahiro Ishii | 2016-08-09 |
| 9360756 | Composition for forming fine resist pattern and pattern formation method using same | Kazuma Yamamoto, Masahiro Ishii, Hiroshi Yanagita, Shigemasa Nakasugi, Go Noya | 2016-06-07 |
| 9091920 | Photosensitive siloxane resin composition | Daishi Yokoyama, Takashi Fuke, Yuki Tashiro, Toshiaki Nonaka, Yasuaki Tanaka | 2015-07-28 |
| 8993214 | Positive photosensitive siloxane composition | Daishi Yokoyama, Takashi Fuke, Yuji Tashiro, Toshiaki Nonaka | 2015-03-31 |
| 8906993 | Coating composition containing siloxane resin | Daishi Yokoyama, Takashi Fuke, Yuji Tashiro, Toshiaki Nonaka, Yasuaki Tanaka | 2014-12-09 |
| 8883397 | Positive photosensitive siloxane composition | Daishi Yokoyama, Takashi Fuke, Yuji Tashiro, Toshiaki Nonaka | 2014-11-11 |