SN

Shigemasa Nakasugi

AS Az Electronic Materials (Luxembourg) S.A.R.L.: 6 patents #10 of 145Top 7%
Merck: 5 patents #2,116 of 9,382Top 25%
AU Az Electronic Materials Usa: 1 patents #76 of 135Top 60%
Overall (All Time): #394,635 of 4,157,543Top 10%
12
Patents All Time

Issued Patents All Time

Showing 1–12 of 12 patents

Patent #TitleCo-InventorsDate
12242195 Method for manufacturing cured film and use of the same Takashi Sekito, Hiroshi Yanagita, Taku Hirayama 2025-03-04
11914296 Ethynyl derived composite, a composition comprising thereof, a method for manufacturing a coating by it, and a method for manufacturing a device comprising the coating Yusuke Hama, Hiroshi Yanagita, Takashi Sekito, Yuriko Matsuura 2024-02-27
11609498 Ethynyl derived composite, a composition comprising thereof, a method for manufacturing a coating by it, and a method for manufacturing a device comprising the coating Yusuke Hama, Hiroshi Yanagita, Takashi Sekito, Yuriko Matsuura 2023-03-21
11450805 Compound, semiconductor material, and methods for manufacturing coating and semiconductor using the same Hiroshi Yanagita, Kazunori Kurosawa, Takashi Sekito, Yusuke Hama, Yuriko Matsuura 2022-09-20
11366389 Allyloxy derivative, resist underlayer forming composition using the same, and method of manufacturing resist underlayer and semiconductor device using the same Hiroshi Yanagita, Takashi Sekito, Yusuke Hama, Yuriko Matsuura 2022-06-21
10451971 Composition for forming underlayer and method for forming underlayer therewith Masato Suzuki, Yusuke Hama, Hiroshi Yanagita, Go Noya 2019-10-22
10435555 Void forming composition, semiconductor device provided with voids formed using composition, and method for manufacturing semiconductor device using composition Takafumi KINUTA, Go Noya 2019-10-08
10106428 Method for producing surface-modified silica nanoparticles, and surface-modified silica nanoparticles Hiroshi Yanagita, Hiroshi HITOKAWA, Tomohide KATAYAMA, Katsuyuki Sakamoto 2018-10-23
9360756 Composition for forming fine resist pattern and pattern formation method using same Kazuma Yamamoto, Masahiro Ishii, Takashi Sekito, Hiroshi Yanagita, Go Noya 2016-06-07
9328198 Composition for forming resist underlayer Masato Suzuki, Jin Li, Motoki Misumi, Yasuaki Ide 2016-05-03
8900797 Developable bottom anti-reflective coating Shinji Miyazaki, Munirathna Padmanaban, Alberto D. Dioses 2014-12-02
8697336 Composition for forming a developable bottom antireflective coating Kazuma Yamamoto, Yasushi Akiyama, Shinji Miyazaki, Munirathna Padmanaban, Srinivasan Chakrapani 2014-04-15