Issued Patents All Time
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9499698 | Metal hardmask composition and processes for forming fine patterns on semiconductor substrates | Huirong Yao, Elizabeth WOLFER, Salem K. Mullen, JoonYeon Cho | 2016-11-22 |
| 9418836 | Polyoxometalate and heteropolyoxometalate compositions and methods for their use | Venkata Gopal Reddy Chada, Huirong Yao, Munirathna Padmanaban, JoonYeon Cho, Elizabeth WOLFER +1 more | 2016-08-16 |
| 9409793 | Spin coatable metallic hard mask compositions and processes thereof | Venkata Gopal Reddy Chada, Huirong Yao, Salem K. Mullen, Elizabeth WOLFER, JoonYeon Cho +1 more | 2016-08-09 |
| 9274426 | Antireflective coating compositions and processes thereof | M. Dalil Rahman, Takanori Kudo, Douglas McKenzie, Clement Anyadiegwu, Munirathna Padmanaban +1 more | 2016-03-01 |
| 9146467 | Coating compositions | Francis Houlihan, Lin Zhang, Meng Li | 2015-09-29 |
| 8900797 | Developable bottom anti-reflective coating | Shigemasa Nakasugi, Shinji Miyazaki, Munirathna Padmanaban | 2014-12-02 |
| 8623589 | Bottom antireflective coating compositions and processes thereof | Takanori Kudo, Edward Ng, Srinivasan Chakrapani, Munirathna Padmanaban | 2014-01-07 |
| 8455176 | Coating composition | Francis Houlihan, Lin Zhang, Meng Li | 2013-06-04 |
| 8088548 | Bottom antireflective coating compositions | Francis Houlihan, Shinji Miyazaki, Mark Neisser, Joseph E. Oberlander | 2012-01-03 |
| 6733949 | Novolak resin mixtures and photosensitive compositions comprising the same | J. Neville Eilbeck | 2004-05-11 |
| 6391514 | Mixed solvent system for positive photoresists | J. Neville Eilbeck | 2002-05-21 |