Issued Patents All Time
Showing 1–25 of 36 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9335636 | Method of patterning a device | John Andrew DeFranco, Charles Warren Wright, Diane C. Freeman, Frank Xavier Byrne, Douglas R. Robello +2 more | 2016-05-10 |
| 9146467 | Coating compositions | Lin Zhang, Alberto D. Dioses, Meng Li | 2015-09-29 |
| 9122167 | Method of patterning a device | John Andrew DeFranco, Charles Warren Wright, Diane C. Freeman, Frank Xavier Byrne, Douglas R. Robello +2 more | 2015-09-01 |
| 8632948 | Positive-working photoimageable bottom antireflective coating | Munirathna Padmanaban, Srinivasan Chakrapani, Shinji Miyazaki, Edward Ng, Mark Neisser | 2014-01-21 |
| 8455176 | Coating composition | Lin Zhang, Alberto D. Dioses, Meng Li | 2013-06-04 |
| 8211621 | Antireflective coating compositions | David Abdallah, Mark Neisser | 2012-07-03 |
| 8088548 | Bottom antireflective coating compositions | Shinji Miyazaki, Mark Neisser, Alberto D. Dioses, Joseph E. Oberlander | 2012-01-03 |
| 8088564 | Base soluble polymers for photoresist compositions | David Abdallah | 2012-01-03 |
| 8017296 | Antireflective coating composition comprising fused aromatic rings | David Abdallah, M. Dalil Rahman, Douglas McKenzie, Ruzhi Zhang, Allen G. Timko +2 more | 2011-09-13 |
| 7833693 | Photoactive compounds | M. Dalil Rahman, Munirathna Padmanaban, Sangho Lee, Ralph R. Dammel, David L. Rentkiewicz +1 more | 2010-11-16 |
| 7759046 | Antireflective coating compositions | David Abdallah, Mark Neisser | 2010-07-20 |
| 7550249 | Base soluble polymers for photoresist compositions | David Abdallah | 2009-06-23 |
| 7537879 | Photoresist composition for deep UV and process thereof | Ralph R. Dammel, Andrew R. Romano, Munirathna Padmanaban, M. Dalil Rahman | 2009-05-26 |
| 7521170 | Photoactive compounds | M. Dalil Rahman, Munirathna Padmanaban, Sangho Lee, Ralph R. Dammel, David L. Rentkiewicz +1 more | 2009-04-21 |
| 7473512 | Process of imaging a deep ultraviolet photoresist with a top coating and materials thereof | Ralph R. Dammel, Andrew R. Romano, Raj Sakamuri | 2009-01-06 |
| 7358408 | Photoactive compounds | M. Dalil Rahman | 2008-04-15 |
| 7351521 | Photoresist composition for deep ultraviolet lithography | Ralph R. Dammel, Raj Sakamuri | 2008-04-01 |
| 7211366 | Photoresist composition for deep ultraviolet lithography | Ralph R. Dammel, Raj Sakamuri | 2007-05-01 |
| 7042645 | Micro-lens array and method of making micro-lens array | Madanagopal Kunnavakkam, James A. Liddle, Omkaram Nalamasu | 2006-05-09 |
| 6700708 | Micro-lens array and method of making micro-lens array | Madanagopal Kunnavakkam, James A. Liddle, Omkaram Nalamasu | 2004-03-02 |
| 6396983 | Formation of gratings in optical fibers coated with UV-curable polymer | Robert M. Atkins, Arturo Hale, Valerie Jeanne Kuck, Richard Olsson, Mark Anthony Paczkowski +1 more | 2002-05-28 |
| 6296984 | Energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material | Allen H. Gabor, Omkaram Nalamasu | 2001-10-02 |
| 6204304 | Vinyl ether-based optical fiber coatings | Mark Anthony Paczkowski, Debra A Simoff, Ulrike Varlemann, Nanze Patrick Wang | 2001-03-20 |
| 6159665 | Processes using photosensitive materials including a nitro benzyl ester photoacid generator | Evelyn Chin, Omkaram Nalamasu | 2000-12-12 |
| 6111133 | Process for preparing substituted styrenes | — | 2000-08-29 |