EC

Evelyn Chin

AT AT&T: 2 patents #7,280 of 18,772Top 40%
📍 Scotch Plains, NJ: #244 of 466 inventorsTop 55%
🗺 New Jersey: #29,833 of 69,400 inventorsTop 45%
Overall (All Time): #2,244,567 of 4,157,543Top 55%
2
Patents All Time

Issued Patents All Time

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
6159665 Processes using photosensitive materials including a nitro benzyl ester photoacid generator Francis Houlihan, Omkaram Nalamasu 2000-12-12
5830619 Resist materials Francis Houlihan, Omkaram Nalamasu 1998-11-03