| 11914296 |
Ethynyl derived composite, a composition comprising thereof, a method for manufacturing a coating by it, and a method for manufacturing a device comprising the coating |
Shigemasa Nakasugi, Hiroshi Yanagita, Takashi Sekito, Yuriko Matsuura |
2024-02-27 |
| 11609498 |
Ethynyl derived composite, a composition comprising thereof, a method for manufacturing a coating by it, and a method for manufacturing a device comprising the coating |
Shigemasa Nakasugi, Hiroshi Yanagita, Takashi Sekito, Yuriko Matsuura |
2023-03-21 |
| 11450805 |
Compound, semiconductor material, and methods for manufacturing coating and semiconductor using the same |
Shigemasa Nakasugi, Hiroshi Yanagita, Kazunori Kurosawa, Takashi Sekito, Yuriko Matsuura |
2022-09-20 |
| 11366389 |
Allyloxy derivative, resist underlayer forming composition using the same, and method of manufacturing resist underlayer and semiconductor device using the same |
Shigemasa Nakasugi, Hiroshi Yanagita, Takashi Sekito, Yuriko Matsuura |
2022-06-21 |
| 10451971 |
Composition for forming underlayer and method for forming underlayer therewith |
Masato Suzuki, Hiroshi Yanagita, Go Noya, Shigemasa Nakasugi |
2019-10-22 |
| 10268117 |
Top-layer membrane formation composition and method for forming resist pattern using same |
Masato Suzuki, Xiaowei Wang, Tetsuo Okayasu, Georg Pawlowski |
2019-04-23 |
| 9804493 |
Composition for forming topcoat layer and resist pattern formation method employing the same |
Hyun-Woo Kim, Cheol-Hong Park, Tetsuo Okayasu, Xiaowei Wang, Georg Pawlowski |
2017-10-31 |