YH

Yusuke Hama

Merck: 4 patents #2,506 of 9,382Top 30%
AS Az Electronic Materials (Luxembourg) S.A.R.L.: 3 patents #37 of 145Top 30%
Samsung: 1 patents #49,284 of 75,807Top 70%
Overall (All Time): #691,695 of 4,157,543Top 20%
7
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
11914296 Ethynyl derived composite, a composition comprising thereof, a method for manufacturing a coating by it, and a method for manufacturing a device comprising the coating Shigemasa Nakasugi, Hiroshi Yanagita, Takashi Sekito, Yuriko Matsuura 2024-02-27
11609498 Ethynyl derived composite, a composition comprising thereof, a method for manufacturing a coating by it, and a method for manufacturing a device comprising the coating Shigemasa Nakasugi, Hiroshi Yanagita, Takashi Sekito, Yuriko Matsuura 2023-03-21
11450805 Compound, semiconductor material, and methods for manufacturing coating and semiconductor using the same Shigemasa Nakasugi, Hiroshi Yanagita, Kazunori Kurosawa, Takashi Sekito, Yuriko Matsuura 2022-09-20
11366389 Allyloxy derivative, resist underlayer forming composition using the same, and method of manufacturing resist underlayer and semiconductor device using the same Shigemasa Nakasugi, Hiroshi Yanagita, Takashi Sekito, Yuriko Matsuura 2022-06-21
10451971 Composition for forming underlayer and method for forming underlayer therewith Masato Suzuki, Hiroshi Yanagita, Go Noya, Shigemasa Nakasugi 2019-10-22
10268117 Top-layer membrane formation composition and method for forming resist pattern using same Masato Suzuki, Xiaowei Wang, Tetsuo Okayasu, Georg Pawlowski 2019-04-23
9804493 Composition for forming topcoat layer and resist pattern formation method employing the same Hyun-Woo Kim, Cheol-Hong Park, Tetsuo Okayasu, Xiaowei Wang, Georg Pawlowski 2017-10-31