Issued Patents All Time
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11161982 | Film forming composition and film forming method using the same | Yuki Ozaki, Masakazu Kobayashi | 2021-11-02 |
| 11059995 | Film forming composition | Masahiko Kubo, Noboru Satake, Yoshio Nojima, Yuki Ozaki, Toshiya OKAMURA | 2021-07-13 |
| 10451971 | Composition for forming underlayer and method for forming underlayer therewith | Masato Suzuki, Yusuke Hama, Hiroshi Yanagita, Shigemasa Nakasugi | 2019-10-22 |
| 10435555 | Void forming composition, semiconductor device provided with voids formed using composition, and method for manufacturing semiconductor device using composition | Shigemasa Nakasugi, Takafumi KINUTA | 2019-10-08 |
| 9494867 | Rinsing liquid for lithography and pattern forming method using same | Yuriko Matsuura, Sara Tsuyuki | 2016-11-15 |
| 9360756 | Composition for forming fine resist pattern and pattern formation method using same | Kazuma Yamamoto, Masahiro Ishii, Takashi Sekito, Hiroshi Yanagita, Shigemasa Nakasugi | 2016-06-07 |
| 9152052 | Composition for forming tungsten oxide film and method for producing tungsten oxide film using same | — | 2015-10-06 |
| 8568955 | Composition for formation of top antireflective film, and pattern formation method using the composition | Yasushi Akiyama, Katsutoshi Kuramoto, Yusuke Takano | 2013-10-29 |
| 8501394 | Superfine-patterned mask, method for production thereof, and method employing the same for forming superfine-pattern | Yusuke Takano, Jin Li, Tomonori Ishikawa | 2013-08-06 |
| 8101333 | Method for formation of miniaturized pattern and resist substrate treatment solution for use in the method | Ryuta Shimazaki, Masakazu Kobayashi | 2012-01-24 |
| 7998664 | Processing liquid for resist substrate and method of processing resist substrate using the same | Masakazu Kobayashi, Ryuta Shimazaki | 2011-08-16 |