Issued Patents All Time
Showing 1–23 of 23 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12077727 | Semiconductor aqueous composition and use of the same | Kazuma Yamamoto, Maki ISHII | 2024-09-03 |
| 12068150 | Substrate cleaning solution, and using the same, method for manufacturing cleaned substrate and method for manufacturing device | Takafumi KINUTA, Yuko HORIBA | 2024-08-20 |
| 11901173 | Substrate processing method | Yukifumi YOSHIDA, Manabu OKUTANI, Shuichi Yasuda, Yasunori Kanematsu, Dai Ueda +2 more | 2024-02-13 |
| 11859152 | Substrate pattern filling composition and use of the same | Yuko HORIBA, Hiroko Kuboki | 2024-01-02 |
| 11392035 | Gap filling composition and pattern forming method using composition containing polymer | Xiaowei Wang | 2022-07-19 |
| 11260431 | Substrate processing method and substrate processing apparatus | Yukifumi YOSHIDA, Manabu OKUTANI, Shuichi Yasuda, Yasunori Kanematsu, Dai Ueda +2 more | 2022-03-01 |
| 11211241 | Substrate processing method and substrate processing apparatus | Yukifumi YOSHIDA, Manabu OKUTANI, Shuichi Yasuda, Yasunori Kanematsu, Dai Ueda +2 more | 2021-12-28 |
| 11169443 | Gap filling composition and pattern forming method using low molecular weight compound | Xiaowei Wang | 2021-11-09 |
| 11156920 | Lithography composition, a method for forming resist patterns and a method for making semiconductor devices | Kazuma Yamamoto, Maki ISHII, Tomoyasu YASHIMA | 2021-10-26 |
| 10792712 | Substrate processing method and substrate processing apparatus | Yukifumi YOSHIDA, Manabu OKUTANI, Shuichi Yasuda, Yasunori Kanematsu, Dai Ueda +2 more | 2020-10-06 |
| 10670969 | Reverse pattern formation composition, reverse pattern formation method, and device formation method | Xiaowei Wang | 2020-06-02 |
| 10494261 | Inorganic polysilazane resin | Takashi Fujiwara, Ralf GROTTENMUELLER, Takashi Kanda | 2019-12-03 |
| 10451974 | Rinse composition, a method for forming resist patterns and a method for making semiconductor devices | Kazuma Yamamoto, Yuriko Matsuura, Tomoyasu YASHIMA | 2019-10-22 |
| 10191380 | Composition for resist patterning and method for forming pattern using same | Kazuma Yamamoto | 2019-01-29 |
| 10000386 | Method for forming of siliceous film and siliceous film formed using same | Masanobu Hayashi | 2018-06-19 |
| 9921481 | Fine resist pattern-forming composition and pattern forming method using same | Kazuma Yamamoto, Yoshihiro Miyamoto, Takashi Sekito | 2018-03-20 |
| 9411232 | Composition for forming fine resist pattern, and pattern formation method using same | Takashi Sekito, Kazuma Yamamoto, Masakazu Kobayashi, Noboru Satake, Masahiro Ishii | 2016-08-09 |
| 9165818 | Method for forming insulating film | Yusuke Takano, Shinde Ninad, Takafumi Iwata | 2015-10-20 |
| 9029071 | Silicon oxynitride film formation method and substrate equipped with silicon oxynitride film formed thereby | Ninad Shinde, Yusuke Takano | 2015-05-12 |
| 8969172 | Method for forming isolation structure | Naoko Nakamoto, Katsuchika Suzuki, Shinji Sugahara | 2015-03-03 |
| 8889229 | Method for formation of siliceous film and siliceous film formed by the method | Masanobu Hayashi | 2014-11-18 |
| 6902875 | Photosensitive polysilazane composition, method of forming pattern therefrom, and method of burning coating film thereof | Hideki Matsuo | 2005-06-07 |
| 5177578 | Polycrystalline silicon thin film and transistor using the same | Hisashi Kakinoki, Keitaro Fukui | 1993-01-05 |