Issued Patents All Time
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12068175 | Substrate processing apparatus, mixing method, and substrate processing method | Kouji Ogura, Jun Nonaka, Takao Inada, Hiroshi Yoshida | 2024-08-20 |
| 11257692 | Substrate processing apparatus, mixing method, and substrate processing method | Kouji Ogura, Jun Nonaka, Takao Inada, Hiroshi Yoshida | 2022-02-22 |
| 10844332 | Aqueous cleaning solution and method of protecting features on a substrate during etch residue removal | Takayuki Toshima, Hiroshi Marumoto, Trace Hurd | 2020-11-24 |
| 9514958 | Etching method of semiconductor substrate, and method of producing semiconductor device | Tetsuya KAMIMURA, Tadashi Inaba, Atsushi Mizutani | 2016-12-06 |
| 7857985 | Metal-polishing liquid and chemical mechanical polishing method using the same | Katsuhiro Yamashita, Kenji Takenouchi, Tomoo Kato, Mihoko Ishima | 2010-12-28 |
| 7851426 | Cleaning liquid and cleaning method using the same | — | 2010-12-14 |
| 7836721 | Cooling system | Tsuneo Nakama, Shigeru Sakashita | 2010-11-23 |
| 7255972 | Chemically amplified positive photosensitive resin composition | Toshimichi Makii | 2007-08-14 |
| 6939661 | Blocked isocyanate compound-containing composition for forming a radiation absorbing coating and anti-reflective coating formed therefrom | Wen-Bing Kang, Ken Kimura, Shoko Matsuo, Hatsuyuki Tanaka | 2005-09-06 |
| 6465161 | Method for forming resist pattern | Wen-Bing Kang, Shoko Matsuo, Ken Kimura, Hatsuyuki Tanaka | 2002-10-15 |
| 6465148 | Composition for light absorption film formation containing blocked isocyanate compound and antireflection film formed therefrom | Wen-Bing Kang, Ken Kimura, Shoko Matsuo, Hatsuyuki Tanaka | 2002-10-15 |
| 6277750 | Composition for bottom reflection preventive film and novel polymeric dye for use in the same | Georg Pawlowski, Munirathna Padmanaban, Wen-Bing Kang, Hatsuyuki Tanaka, Ken Kimura | 2001-08-21 |
| 6255405 | Light-absorbing polymers and application thereof to anti-reflection film | Wen-Bing Kang, Ken Kimura, Syoko Matsuo, Hatsuyuki Tanaka | 2001-07-03 |