Issued Patents All Time
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12068175 | Substrate processing apparatus, mixing method, and substrate processing method | Kouji Ogura, Jun Nonaka, Yoshinori Nishiwaki, Hiroshi Yoshida | 2024-08-20 |
| 11742226 | Substrate liquid processing apparatus | Takahiko Otsu, Kazuya Koyama | 2023-08-29 |
| 11724235 | Mixing apparatus, mixing method and substrate processing system | Jun Nonaka, Kouji Ogura | 2023-08-15 |
| 11424141 | Substrate processing apparatus, substrate processing method and recording medium | Jian Zhang, Hisashi Kawano, Seigo Fujitsu, Hideaki Sato, Teruaki Konishi +3 more | 2022-08-23 |
| 11309194 | Substrate liquid treatment apparatus | Koji Tanaka, Toshiyuki Shiokawa, Koji Yamashita, Hiroyuki Masutomi, Hitoshi Kosugi +2 more | 2022-04-19 |
| 11257692 | Substrate processing apparatus, mixing method, and substrate processing method | Kouji Ogura, Jun Nonaka, Yoshinori Nishiwaki, Hiroshi Yoshida | 2022-02-22 |
| 11087992 | Substrate processing method and substrate processing apparatus | Tsukasa Hirayama, Hironobu Hyakutake, Kazuya Koyama, Hisashi Kawano | 2021-08-10 |
| 11075096 | Substrate processing apparatus | Hironobu Hyakutake, Hisashi Kawano | 2021-07-27 |
| 10923368 | Substrate processing apparatus, substrate processing method, and storage medium | Hisashi Kawano, Hiroki Ohno | 2021-02-16 |
| 10651061 | Substrate processing apparatus, substrate processing method and recording medium | Hiroki Ohno, Hisashi Kawano | 2020-05-12 |
| 10643874 | Substrate liquid processing apparatus, substrate liquid processing method, and storage medium | Hiroshi Tanaka, Tsukasa Hirayama | 2020-05-05 |
| 9224624 | Liquid processing method | Naoyuki Okamura, Hidetsugu Yano, Yosuke Hachiya | 2015-12-29 |
| 9070549 | Substrate processing apparatus and substrate processing method | Hiroshi Tanaka, Toshiyuki Shiokawa | 2015-06-30 |
| 8951359 | Liquid processing apparatus, liquid processing method and computer-readable storage medium storing liquid processing program | Naoyuki Okamura, Hidetsugu Yano, Yosuke Hachiya | 2015-02-10 |