HK

Hitoshi Kosugi

TL Tokyo Electron Limited: 17 patents #362 of 5,567Top 7%
TK Toyo Boseki Kabushiki Kaisha: 1 patents #541 of 1,085Top 50%
Overall (All Time): #247,392 of 4,157,543Top 6%
18
Patents All Time

Issued Patents All Time

Showing 1–18 of 18 patents

Patent #TitleCo-InventorsDate
12371796 Substrate processing apparatus, substrate processing method, and chemical liquid Tetsuya Sakazaki 2025-07-29
12002687 System and methods for wafer drying Trace Hurd, Antonio Luis Pacheco Rotondaro, Derek Bassett 2024-06-04
11545367 Substrate processing apparatus, substrate processing method, and chemical liquid Tetsuya Sakazaki 2023-01-03
11515178 System and methods for wafer drying Trace Hurd, Antonio Luis Pacheco Rotondaro, Derek Bassett 2022-11-29
11309194 Substrate liquid treatment apparatus Koji Tanaka, Toshiyuki Shiokawa, Koji Yamashita, Hiroyuki Masutomi, Takao Inada +2 more 2022-04-19
11217451 Substrate processing method and substrate processing apparatus Shota Umezaki, Kouzou Tachibana, Ryo Yamamoto 2022-01-04
8889337 Film forming method, film forming apparatus and pattern forming method Taro Yamamoto, Yoshiaki Yamada, Yasuhito Saiga 2014-11-18
8420303 Substrate processing method, computer-readable storage medium and substrate processing system Yoshiaki Yamada, Keiichi Tanaka 2013-04-16
8376637 Photoresist coating and developing apparatus, substrate transfer method and interface apparatus Yoshiaki Yamada, Yuichi Yamamoto, Seiji Fujimoto 2013-02-19
8133663 Pattern forming method and apparatus Taro Yamamoto, Yoshiaki Yamada, Yasuhito Saiga 2012-03-13
7924396 Coating/developing apparatus and pattern forming method Hisashi Kawano, Junichi Kitano, Koichi Hontake, Masashi Enomoto 2011-04-12
7826032 Circulation system for high refractive index liquid in pattern forming apparatus Taro Yamamoto, Yoshiaki Yamada, Yasuhito Saiga 2010-11-02
7733472 Method and system for determining condition of process performed for coating film before immersion light exposure Taro Yamamoto 2010-06-08
7651285 Edge exposure apparatus, coating and developing apparatus, edge exposure method and coating and developing method, and storage medium Taro Yamamoto, Yoshiaki Yamada, Yasuhito Saiga 2010-01-26
7431040 Method and apparatus for dispensing a rinse solution on a substrate 2008-10-07
6780940 Adhesive resin composition and method for separating adherends bonded together by the composition Nori Yoshihara, Kenji Ohama, Satoshi Sakai, Koji Nakanishi 2004-08-24
6496245 Developing method and developing apparatus Hideharu Kyouda 2002-12-17
6267516 Developing apparatus and developing nozzle Shuichi Nagamine, Masami Akimoto, Akira Nishiya 2001-07-31