WK

Wen-Bing Kang

CL Clariant Finance (Bvi) Limited: 7 patents #35 of 535Top 7%
Hoechst Gmbh: 5 patents #756 of 4,020Top 20%
CL Clariant: 2 patents #91 of 485Top 20%
AU Az Electronic Materials Usa: 1 patents #76 of 135Top 60%
HL Hoechst Japan Limited: 1 patents #49 of 137Top 40%
📍 Kawagoe, JP: #90 of 1,278 inventorsTop 8%
Overall (All Time): #299,184 of 4,157,543Top 8%
16
Patents All Time

Issued Patents All Time

Showing 1–16 of 16 patents

Patent #TitleCo-InventorsDate
8663906 Silicon-containing composition for fine pattern formation and method for fine pattern formation using the same Ralph R. Dammel, Yasuo Shimizu, Tomonori Ishikawa 2014-03-04
6939661 Blocked isocyanate compound-containing composition for forming a radiation absorbing coating and anti-reflective coating formed therefrom Ken Kimura, Shoko Matsuo, Yoshinori Nishiwaki, Hatsuyuki Tanaka 2005-09-06
6803168 Composition for anti-reflective coating or radiation absorbing coating and compounds used in the composition Munirathna Padmanaban, Hatsuyuki Tanaka, Ken Kimura, Georg Pawlowski 2004-10-12
6737492 Radiation absorbing polymer, composition for radiation absorbing coating, radiation absorbing coating and application thereof as anti-reflective coating Munirathna Padmanaban, Hatsuyuki Tanaka, Ken Kimura, Takanori Kudo, Georg Pawlowski 2004-05-18
6559473 Light-emitting diodes with hetero-PN-junction Nu Yu, Akihiko Tokida 2003-05-06
6468718 Radiation absorbing polymer, composition for radiation absorbing coating, radiation absorbing coating and application thereof as anti-reflective coating Munirathna Padmanaban, Hatsuyuki Tanaka, Ken Kimura, Takanori Kudo, Georg Pawlowski 2002-10-22
6465161 Method for forming resist pattern Shoko Matsuo, Ken Kimura, Yoshinori Nishiwaki, Hatsuyuki Tanaka 2002-10-15
6465148 Composition for light absorption film formation containing blocked isocyanate compound and antireflection film formed therefrom Ken Kimura, Shoko Matsuo, Yoshinori Nishiwaki, Hatsuyuki Tanaka 2002-10-15
6361917 Process for patterning poly(arylenevinylene) polymer films by irradiation with light Nu Yu, Akihiko Tokida 2002-03-26
6329117 Antireflection or light-absorbing coating composition and polymer therefor Munirathna Padmanaban, Georg Pawlowski, Ken Kimura, Hatsuyuki Tanaka 2001-12-11
6277750 Composition for bottom reflection preventive film and novel polymeric dye for use in the same Georg Pawlowski, Munirathna Padmanaban, Hatsuyuki Tanaka, Ken Kimura, Yoshinori Nishiwaki 2001-08-21
6255405 Light-absorbing polymers and application thereof to anti-reflection film Yoshinori Nishiwaki, Ken Kimura, Syoko Matsuo, Hatsuyuki Tanaka 2001-07-03
5919579 Organic electroluminescent device Nu Yu, Akihiko Tokida, Thomas Potrawa, Andreas Winterfeldt 1999-07-06
5871854 Organic electroluminescent device Akihiko Tokida, Nu Yu, Thomas Potrawa, Andreas Winterfeldt 1999-02-16
5844249 Apparatus for detecting defects of wires on a wiring board wherein optical sensor includes a film of polymer non-linear optical material Yusuke Takano, Shizuo Ogura, Tsunetoshi Sugiyama 1998-12-01
5652327 Triazine polymers Tsunetoshi Sugiyama, Shizuo Ogura, Yusuke Takano 1997-07-29