Issued Patents All Time
Showing 101–125 of 147 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6210050 | Resist developing method and apparatus with nozzle offset for uniform developer application | Marina V. Plat | 2001-04-03 |
| 6200907 | Ultra-thin resist and barrier metal/oxide hard mask for metal etch | Fei Wang, Khanh B. Nguyen, Scott A. Bell, Harry J. Levinson, Chih-Yuh Yang | 2001-03-13 |
| 6187666 | CVD plasma process to fill contact hole in damascene process | Bhanwar Singh, Michael K. Templeton, Bharath Rangarajan, Sanjay K. Yedur, Ramkumar Subramanian | 2001-02-13 |
| 6183938 | Conformal organic coatings for sidewall patterning of sublithographic structures | Michael K. Templeton | 2001-02-06 |
| 6184128 | Method using a thin resist mask for dual damascene stop layer etch | Fei Wang, Khanh B. Nguyen, Scott A. Bell, Harry J. Levinson, Chih-Yuh Yang | 2001-02-06 |
| 6171962 | Shallow trench isolation formation without planarization mask | Olov Karlsson, Basab Bandyopadhyay, Nick Kepler, Larry Wang, Effiong Ibok | 2001-01-09 |
| 6171763 | Ultra-thin resist and oxide/nitride hard mask for metal etch | Fei Wang, Khanh B. Nguyen, Scott A. Bell, Harry J. Levinson, Chih-Yuh Yang | 2001-01-09 |
| 6165695 | Thin resist with amorphous silicon hard mask for via etch application | Chih-Yuh Yang, Harry J. Levinson, Khanh B. Nguyen, Fei Wang, Scott A. Bell | 2000-12-26 |
| 6162699 | Method for generating limited isolation trench width structures and a device having a narrow isolation trench surrounding its periphery | Larry Wang, Nick Kepler, Olov Karlsson, Basab Bandyopadhyay, Effiong Ibok | 2000-12-19 |
| 6162587 | Thin resist with transition metal hard mask for via etch application | Chih-Yuh Yang, Harry J. Levinson, Khanh B. Nguyen, Fei Wang, Scott A. Bell | 2000-12-19 |
| 6156658 | Ultra-thin resist and silicon/oxide hard mask for metal etch | Fei Wang, Khanh B. Nguyen, Scott A. Bell, Harry J. Levinson, Chih-Yuh Yang | 2000-12-05 |
| 6156480 | Low defect thin resist processing for deep submicron lithography | — | 2000-12-05 |
| 6143624 | Shallow trench isolation formation with spacer-assisted ion implantation | Nick Kepler, Olov Karlsson, Larry Wang, Basab Bandyopadhyay, Effiong Ibok | 2000-11-07 |
| 6140023 | Method for transferring patterns created by lithography | Harry J. Levinson, Scott A. Bell, Khanh B. Nguyen, Fei Wang, Chih-Yuh Yang | 2000-10-31 |
| 6130467 | Shallow trench isolation with spacers for improved gate oxide quality | Basab Bandyopadhyay, Nick Kepler, Olov Karlsson, Larry Wang, Effiong Ibok | 2000-10-10 |
| 6127070 | Thin resist with nitride hard mask for via etch application | Chih-Yuh Yang, Harry J. Levinson, Khanh B. Nguyen, Fei Wang, Scott A. Bell | 2000-10-03 |
| 6127089 | Interconnect structure with low k dielectric materials and method of making the same with single and dual damascene techniques | Ramkumar Subramanian, Uzodinma Okoroanyanwu | 2000-10-03 |
| 6124183 | Shallow trench isolation formation with simplified reverse planarization mask | Olov Karlsson, Basab Bandyopadhyay, Nick Kepler, Larry Wang, Effiong Ibok | 2000-09-26 |
| 6121123 | Gate pattern formation using a BARC as a hardmask | Scott A. Bell, Olov Karlsson | 2000-09-19 |
| 6114235 | Multipurpose cap layer dielectric | David K. Foote, Minh Van Ngo, Fei Wang, Raymond T. Lee, William G. En +2 more | 2000-09-05 |
| 6103611 | Methods and arrangements for improved spacer formation within a semiconductor device | William G. En, Minh Van Ngo, Chih-Yuh Yang, David K. Foote, Scott A. Bell +1 more | 2000-08-15 |
| 6090713 | Shallow trench isolation formation with simplified reverse planarization mask | Olov Karlsson, Basab Bandyophadhyay, Nick Kepler, Larry Wang, Effiong Ibok | 2000-07-18 |
| 6090712 | Shallow trench isolation formation with no polish stop | Basab Bandyopadhyay, Nick Kepler, Olov Karlsson, Larry Wang, Effiong Obok | 2000-07-18 |
| 6087271 | Methods for removal of an anti-reflective coating following a resist protect etching process | William G. En, Minh Van Ngo, Olov Karlsson, Maria C. Chan | 2000-07-11 |
| 6074927 | Shallow trench isolation formation with trench wall spacer | Nick Kepler, Basab Bandyopadhyay, Olov Karlsson, Larry Wang, Effiong Ibok | 2000-06-13 |