Issued Patents All Time
Showing 1–17 of 17 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7012008 | Dual spacer process for non-volatile memory devices | Jeffrey A. Shields, Tuan Pham, Mark T. Ramsbey, Yu Sun, Angela T. Hui | 2006-03-14 |
| 6610580 | Flash memory array and a method and system of fabrication thereof | Hao Fang, Mark S. Chang, Mike Templeton | 2003-08-26 |
| 6603211 | Method and system for providing a robust alignment mark at thin oxide layers | Michael K. Templeton, Hao Fang, King Wai Kelwin Ko | 2003-08-05 |
| 6593245 | Silicon nitride etch process with critical dimension gain | — | 2003-07-15 |
| 6495435 | Method for improved control of lines adjacent to a select gate using a mask assist feature | Michael K. Templeton, Hao Fang | 2002-12-17 |
| 6455888 | Memory cell structure for elimination of oxynitride (ONO) etch residue and polysilicon stringers | Kathleen R. Early, Michael K. Templeton, Nicholas H. Tripsas | 2002-09-24 |
| 6448594 | Method and system for processing a semiconductor device | Hao Fang, Lu You, Mark S. Chang, King Wai Kelwin Ko | 2002-09-10 |
| 6352930 | Bilayer anti-reflective coating and etch hard mask | Kathleen R. Early, Suzette K. Pangrle, Lewis Shen | 2002-03-05 |
| 6306706 | Method and system for fabricating a flash memory array | Hao Fang, Mark S. Chang | 2001-10-23 |
| 6232002 | Bilayer anti-reflective coating and etch hard mask | Kathleen R. Early, Suzette K. Pangrle, Lewis Shen | 2001-05-15 |
| 6110833 | Elimination of oxynitride (ONO) etch residue and polysilicon stringers through isolation of floating gates on adjacent bitlines by polysilicon oxidation | Kathleen R. Early, Michael K. Templeton, Nicholas H. Tripsas | 2000-08-29 |
| 6087271 | Methods for removal of an anti-reflective coating following a resist protect etching process | William G. En, Minh Van Ngo, Olov Karlsson, Christopher F. Lyons | 2000-07-11 |
| 6046085 | Elimination of poly stringers with straight poly profile | — | 2000-04-04 |
| 6043120 | Elimination of oxynitride (ONO) etch residue and polysilicon stringers through isolation of floating gates on adjacent bitlines by polysilicon oxidation | Kathleen R. Early, Michael K. Templeton, Nicholas H. Tripsas | 2000-03-28 |
| 6030868 | Elimination of oxynitride (ONO) etch residue and polysilicon stringers through isolation of floating gates on adjacent bitlines by polysilicon oxidation | Kathleen R. Early, Michael K. Templeton, Nicholas H. Tripsas, Mark T. Ramsbey | 2000-02-29 |
| 6027959 | Methods for in-situ removal of an anti-reflective coating during a nitride resistor protect etching process | William G. En, Minh Van Ngo, Olov Karlsson | 2000-02-22 |
| 5933729 | Reduction of ONO fence during self-aligned etch to eliminate poly stringers | — | 1999-08-03 |