| 7012008 |
Dual spacer process for non-volatile memory devices |
Jeffrey A. Shields, Tuan Pham, Mark T. Ramsbey, Yu Sun, Angela T. Hui |
2006-03-14 |
| 6610580 |
Flash memory array and a method and system of fabrication thereof |
Hao Fang, Mark S. Chang, Mike Templeton |
2003-08-26 |
| 6603211 |
Method and system for providing a robust alignment mark at thin oxide layers |
Michael K. Templeton, Hao Fang, King Wai Kelwin Ko |
2003-08-05 |
| 6593245 |
Silicon nitride etch process with critical dimension gain |
— |
2003-07-15 |
| 6495435 |
Method for improved control of lines adjacent to a select gate using a mask assist feature |
Michael K. Templeton, Hao Fang |
2002-12-17 |
| 6455888 |
Memory cell structure for elimination of oxynitride (ONO) etch residue and polysilicon stringers |
Kathleen R. Early, Michael K. Templeton, Nicholas H. Tripsas |
2002-09-24 |
| 6448594 |
Method and system for processing a semiconductor device |
Hao Fang, Lu You, Mark S. Chang, King Wai Kelwin Ko |
2002-09-10 |
| 6352930 |
Bilayer anti-reflective coating and etch hard mask |
Kathleen R. Early, Suzette K. Pangrle, Lewis Shen |
2002-03-05 |
| 6306706 |
Method and system for fabricating a flash memory array |
Hao Fang, Mark S. Chang |
2001-10-23 |
| 6232002 |
Bilayer anti-reflective coating and etch hard mask |
Kathleen R. Early, Suzette K. Pangrle, Lewis Shen |
2001-05-15 |
| 6110833 |
Elimination of oxynitride (ONO) etch residue and polysilicon stringers through isolation of floating gates on adjacent bitlines by polysilicon oxidation |
Kathleen R. Early, Michael K. Templeton, Nicholas H. Tripsas |
2000-08-29 |
| 6087271 |
Methods for removal of an anti-reflective coating following a resist protect etching process |
William G. En, Minh Van Ngo, Olov Karlsson, Christopher F. Lyons |
2000-07-11 |
| 6046085 |
Elimination of poly stringers with straight poly profile |
— |
2000-04-04 |
| 6043120 |
Elimination of oxynitride (ONO) etch residue and polysilicon stringers through isolation of floating gates on adjacent bitlines by polysilicon oxidation |
Kathleen R. Early, Michael K. Templeton, Nicholas H. Tripsas |
2000-03-28 |
| 6030868 |
Elimination of oxynitride (ONO) etch residue and polysilicon stringers through isolation of floating gates on adjacent bitlines by polysilicon oxidation |
Kathleen R. Early, Michael K. Templeton, Nicholas H. Tripsas, Mark T. Ramsbey |
2000-02-29 |
| 6027959 |
Methods for in-situ removal of an anti-reflective coating during a nitride resistor protect etching process |
William G. En, Minh Van Ngo, Olov Karlsson |
2000-02-22 |
| 5933729 |
Reduction of ONO fence during self-aligned etch to eliminate poly stringers |
— |
1999-08-03 |