LS

Lewis Shen

AM AMD: 34 patents #265 of 9,279Top 3%
Overall (All Time): #99,425 of 4,157,543Top 3%
35
Patents All Time

Issued Patents All Time

Showing 25 most recent of 35 patents

Patent #TitleCo-InventorsDate
6878622 Method for forming SAC using a dielectric as a BARC and FICD enlarger Wenge Yang, Ramkumar Subramanian, Fei Wang 2005-04-12
6867097 Method of making a memory cell with polished insulator layer Mark T. Ramsbey, Robert B. Ogle, Tommy Hsiao, Angela T. Hui, Tuan Pham +1 more 2005-03-15
6586339 Silicon barrier layer to prevent resist poisoning Marina V. Plat, Robert B. Ogle 2003-07-01
6534411 Method of high density plasma metal etching Wenge Yang 2003-03-18
6515328 Semiconductor devices with reduced control gate dimensions Wenge Yang, Mark S. Chang 2003-02-04
6452225 Method and structure of etching a memory cell polysilicon gate layer using resist mask and etched silicon oxynitride Wenge Yang 2002-09-17
6383939 Method for etching memory gate stack using thin resist layer Wenge Yang 2002-05-07
6372651 Method for trimming a photoresist pattern line for memory gate etching Wenge Yang 2002-04-16
6365509 Semiconductor manufacturing method using a dielectric photomask Ramkumar Subramanian, Wenge Yang, Marina V. Plat 2002-04-02
6355546 Thermally grown protective oxide buffer layer for ARC removal Richard J. Huang 2002-03-12
6352930 Bilayer anti-reflective coating and etch hard mask Kathleen R. Early, Suzette K. Pangrle, Maria C. Chan 2002-03-05
6291329 Protective oxide buffer layer for ARC removal Richard J. Huang 2001-09-18
6271154 Methods for treating a deep-UV resist mask prior to gate formation etch to improve gate profile Wenge Yang 2001-08-07
6232002 Bilayer anti-reflective coating and etch hard mask Kathleen R. Early, Suzette K. Pangrle, Maria C. Chan 2001-05-15
6218310 RTA methods for treating a deep-UV resist mask prior to gate formation etch to improve gate profile Wenge Yang 2001-04-17
6174819 Low temperature photoresist removal for rework during metal mask formation Jeffrey A. Shields, Anne E. Sanderfer 2001-01-16
6159794 Methods for removing silicide residue in a semiconductor device Wenge Yang 2000-12-12
6159860 Method for etching layers on a semiconductor wafer in a single etching chamber Wenge Yang 2000-12-12
6110779 Method and structure of etching a memory cell polysilicon gate layer using resist mask and etched silicon oxynitride Wenge Yang 2000-08-29
6074956 Method for preventing silicide residue formation in a semiconductor device Wenge Yang 2000-06-13
6025268 Method of etching conductive lines through an etch resistant photoresist mask — 2000-02-15
6011289 Metal oxide stack for flash memory application Richard J. Huang 2000-01-04
5977601 Method for etching memory gate stack using thin resist layer Wenge Yang 1999-11-02
5973353 Methods and arrangements for forming a tapered floating gate in non-volatile memory semiconductor devices Wenge Yang 1999-10-26
5948703 Method of soft-landing gate etching to prevent gate oxide damage Wenge Yang 1999-09-07