Issued Patents All Time
Showing 51–75 of 79 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6849530 | Method for semiconductor gate line dimension reduction | Douglas J. Bonser, Marina V. Plat, Chih-Yuh Yang, Scott A. Bell, Philip A. Fisher +1 more | 2005-02-01 |
| 6835618 | Epitaxially grown fin for FinFET | Chih-Yuh Yang, Bin Yu | 2004-12-28 |
| 6833588 | Semiconductor device having a U-shaped gate structure | Bin Yu, Shibly S. Ahmed, Judy Xilin An, Zoran Krivokapic, Haihong Wang | 2004-12-21 |
| 6825114 | Selective stress-inducing implant and resulting pattern distortion in amorphous carbon patterning | Philip A. Fisher, Christopher F. Lyons | 2004-11-30 |
| 6815268 | Method for forming a gate in a FinFET device | Bin Yu, Judy Xilin An | 2004-11-09 |
| 6803631 | Strained channel finfet | Judy Xilin An, Zoran Krivokapic, Haihong Wang, Bin Yu | 2004-10-12 |
| 6797552 | Method for defect reduction and enhanced control over critical dimensions and profiles in semiconductor devices | Mark S. Chang, Douglas J. Bonser, Marina V. Plat, Chih-Yuh Yang, Scott A. Bell | 2004-09-28 |
| 6787854 | Method for forming a fin in a finFET device | Chih-Yuh Yang, Shibly S. Ahmed, Cyrus E. Tabery, Haihong Wang, Bin Yu | 2004-09-07 |
| 6787476 | Etch stop layer for etching FinFET gate over a large topography | Cyrus E. Tabery, Chih-Yuh Yang, Bin Yu | 2004-09-07 |
| 6773998 | Modified film stack and patterning strategy for stress compensation and prevention of pattern distortion in amorphous carbon gate patterning | Philip A. Fisher, Marina V. Plat, Chih-Yuh Yang, Christopher F. Lyons, Scott A. Bell +2 more | 2004-08-10 |
| 6764949 | Method for reducing pattern deformation and photoresist poisoning in semiconductor device fabrication | Douglas J. Bonser, Marina V. Plat, Chih-Yuh Yang, Scott A. Bell, Darin A. Chan +6 more | 2004-07-20 |
| 6762483 | Narrow fin FinFET | Zoran Krivokapic, Judy Xilin An, Haihong Wang, Bin Yu | 2004-07-13 |
| 6750127 | Method for fabricating a semiconductor device using amorphous carbon having improved etch resistance | Mark S. Chang, Darin A. Chan, Chih-Yuh Yang, Lu You, Scott A. Bell +1 more | 2004-06-15 |
| 6696334 | Method for formation of a differential offset spacer | Kay Hellig, Christoph Schwan | 2004-02-24 |
| 6673635 | Method for alignment mark formation for a shallow trench isolation process | Kay Hellig, Douglas J. Bonser | 2004-01-06 |
| 6664604 | Metal gate stack with etch stop layer | Paul R. Besser | 2003-12-16 |
| 6664154 | Method of using amorphous carbon film as a sacrificial layer in replacement gate integration processes | Scott A. Bell, Philip A. Fisher, Cyrus E. Tabery | 2003-12-16 |
| 6657268 | Metal gate stack with etch stop layer having implanted metal species | Paul R. Besser | 2003-12-02 |
| 6645797 | Method for forming fins in a FinFET device using sacrificial carbon layer | Matthew S. Buynoski, Cyrus E. Tabery, Haihong Wang, Chih-Yuh Yang, Bin Yu | 2003-11-11 |
| 6605514 | Planar finFET patterning using amorphous carbon | Cyrus E. Tabery, Scott A. Bell | 2003-08-12 |
| 6596553 | Method of pinhole decoration and detection | David Lin, Scott A. Bell, Philip A. Fisher | 2003-07-22 |
| 6589858 | Method of making metal gate stack with etch endpoint tracer layer | Paul R. Besser | 2003-07-08 |
| 6579801 | Method for enhancing shallow trench top corner rounding using endpoint control of nitride layer etch process with appropriate etch front | Christoph Schwan, Jeffrey C. Haines | 2003-06-17 |
| 6511911 | Metal gate stack with etch stop layer | Paul R. Besser | 2003-01-28 |
| 6500755 | Resist trim process to define small openings in dielectric layers | Paul R. Besser, Jonathan B. Smith, Eric M. Apelgren, Christian Zistl, Jeremy I. Martin +2 more | 2002-12-31 |