Issued Patents All Time
Showing 26–50 of 68 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6787458 | Polymer memory device formed in via opening | Nicholas H. Tripsas, Matthew S. Buynoski, Suzette K. Pangrle, Uzodinma Okoroanyanwu, Angela T. Hui +7 more | 2004-09-07 |
| 6773954 | Methods of forming passive layers in organic memory cells | Ramkumar Subramanian, Jane V. Oglesby, Sergey Lopatin, Christopher F. Lyons, James J. Xie +1 more | 2004-08-10 |
| 6764929 | Method and system for providing a contact hole in a semiconductor device | Angela T. Hui, Chi Chang | 2004-07-20 |
| 6764949 | Method for reducing pattern deformation and photoresist poisoning in semiconductor device fabrication | Douglas J. Bonser, Marina V. Plat, Chih-Yuh Yang, Scott A. Bell, Darin A. Chan +6 more | 2004-07-20 |
| 6753247 | Method(s) facilitating formation of memory cell(s) and patterned conductive | Uzodinma Okoroanyanwu, Suzette K. Pangrle, Matthew S. Buynoski, Nicholas H. Tripsas, Ramkumar Subramanian +1 more | 2004-06-22 |
| 6750127 | Method for fabricating a semiconductor device using amorphous carbon having improved etch resistance | Darin A. Chan, Chih-Yuh Yang, Lu You, Scott A. Bell, Srikanteswara Dakshina-Murthy +1 more | 2004-06-15 |
| 6727195 | Method and system for decreasing the spaces between wordlines | Michael K. Templeton | 2004-04-27 |
| 6642148 | RELACS shrink method applied for single print resist mask for LDD or buried bitline implants using chemically amplified DUV type photoresist | Kouros Ghandehari, Emmanuil H. Lingunis, Angela T. Hui, Scott A. Bell, Jusuke Ogura | 2003-11-04 |
| 6638358 | Method and system for processing a semiconductor device | Lu You, Hao Fang | 2003-10-28 |
| 6610580 | Flash memory array and a method and system of fabrication thereof | Maria C. Chan, Hao Fang, Mike Templeton | 2003-08-26 |
| 6566230 | Shallow trench isolation spacer for weff improvement | Harpreet Sachar, Unsoon Kim, Chih-Yuh Yang, Jayendra D. Bhakta | 2003-05-20 |
| 6515328 | Semiconductor devices with reduced control gate dimensions | Wenge Yang, Lewis Shen | 2003-02-04 |
| 6509232 | Formation of STI (shallow trench isolation) structures within core and periphery areas of flash memory device | Unsoon Kim, Yider Wu, Chi Chang, Angela T. Hui, Yu Sun | 2003-01-21 |
| 6486029 | Integration of an ion implant hard mask structure into a process for fabricating high density memory cells | David K. Foote, Bharath Rangarajan, Stephan K. Park, Fei Wang, Dawn Hopper +2 more | 2002-11-26 |
| 6475847 | Method for forming a semiconductor device with self-aligned contacts using a liner oxide layer | Minh Van Ngo, Yu Sun, Fei Wang, Mark T. Ramsbey, Chi Chang +1 more | 2002-11-05 |
| 6472327 | Method and system for etching tunnel oxide to reduce undercutting during memory array fabrication | King Wai Kelwin Ko, Hao Fang | 2002-10-29 |
| 6448594 | Method and system for processing a semiconductor device | Maria C. Chan, Hao Fang, Lu You, King Wai Kelwin Ko | 2002-09-10 |
| 6444539 | Method for producing a shallow trench isolation filled with thermal oxide | Yu Sun, Angela T. Hui, Yue-Song He, Tatsuya Kajita, Chi Chang +1 more | 2002-09-03 |
| 6444530 | Process for fabricating an integrated circuit with a self-aligned contact | Hung-Sheng Chen, Unsoon Kim, Yu Sun, Chi Chang, Mark T. Ramsbey +4 more | 2002-09-03 |
| 6445051 | Method and system for providing contacts with greater tolerance for misalignment in a flash memory | Hao Fang, King Wai Kelwin Ko, John Jianshi Wang, Michael K. Templeton, Lu You +1 more | 2002-09-03 |
| 6436766 | Process for fabricating high density memory cells using a polysilicon hard mask | Bharath Rangarajan, David K. Foote, Fei Wang, Dawn Hopper, Stephen Keetai Park +2 more | 2002-08-20 |
| 6431182 | Plasma treatment for polymer removal after via etch | Mohammad R. Rakhshandehroo, Angela T. Hui | 2002-08-13 |
| 6420752 | Semiconductor device with self-aligned contacts using a liner oxide layer | Minh Van Ngo, Yu Sun, Fei Wang, Mark T. Ramsbey, Chi Chang +1 more | 2002-07-16 |
| 6420224 | Stepper alignment mark formation with dual field oxide process | Tatsuya Kajita | 2002-07-16 |
| 6399446 | Process for fabricating high density memory cells using a metallic hard mask | Bharath Rangarajan, David K. Foote, Fei Wang, Dawn Hopper, Stephen Keetai Park +2 more | 2002-06-04 |