Issued Patents All Time
Showing 1–18 of 18 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8143661 | Memory cell system with charge trap | Shenqing Fang, Rinji Sugino, Takashi Orimoto, Hiroyuki Nansei, Yukio Hayakawa +8 more | 2012-03-27 |
| 7084074 | CVD gas injector and method therefor | Michael D'Elia, Barry Sheffield, Raymond Branstetter | 2006-08-01 |
| 7061075 | Shallow trench isolation using antireflection layer | Carl P. Babcock | 2006-06-13 |
| 6821883 | Shallow trench isolation using antireflection layer | Carl P. Babcock | 2004-11-23 |
| 6645868 | Method of forming shallow trench isolation using antireflection layer | Carl P. Babcock | 2003-11-11 |
| 6605517 | Method for minimizing nitride residue on a silicon wafer | Krishnashree Achuthan, Angela T. Hui | 2003-08-12 |
| 6566230 | Shallow trench isolation spacer for weff improvement | Harpreet Sachar, Unsoon Kim, Mark S. Chang, Chih-Yuh Yang | 2003-05-20 |
| 6500774 | Method and apparatus for an increased throughput furnace nitride BARC process | — | 2002-12-31 |
| 6482573 | Exposure correction based on reflective index for photolithographic process control | Zicheng Gary Ling, Weizhong Wang, Warren T. Yu, Eric Kent | 2002-11-19 |
| 6475892 | Simplified method of patterning polysilicon gate in a semiconductor device | — | 2002-11-05 |
| 6458212 | Mesh filter design for LPCVD TEOS exhaust system | Fuodoor Gologhlan, David Chi, Kent Kuohua Chang, Hector Serrato | 2002-10-01 |
| 6337264 | Simplified method of patterning polysilicon gate in a semiconductor device including an oxime layer as a mask | — | 2002-01-08 |
| 6335235 | Simplified method of patterning field dielectric regions in a semiconductor device | Carl P. Babcock | 2002-01-01 |
| 6333218 | Method of etching contacts with reduced oxide stress | Minh Van Ngo, Paul R. Besser | 2001-12-25 |
| 6303507 | In-situ feedback system for localized CMP thickness control | Weizhong Wang | 2001-10-16 |
| 6258697 | Method of etching contacts with reduced oxide stress | Paul R. Besser, Minh Van Ngo | 2001-07-10 |
| 6255717 | Shallow trench isolation using antireflection layer | Carl P. Babcock | 2001-07-03 |
| 6107167 | Simplified method of patterning polysilicon gate in a semiconductor device | — | 2000-08-22 |